Contact Connection Structure with Oxide-Film Shaving Arc

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Solution Overview

Problem

Existing contact connection structures face challenges in reducing contact resistance without increasing the size and complexity of terminals, as they often rely on high contact pressure to destroy oxide films, which can lead to inefficient contact between plating layers.

Innovation Solution

A contact connection structure featuring a first contact portion with a spherically protruding indent portion and a second contact portion having an oxide-film shaving portion with an annular arc portion, which accelerates the destruction of oxide films and enhances contact between plating metal pieces, reducing resistance without terminal enlargement.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If high contact pressure is applied to destroy oxide films, then contact resistance is reduced, but terminal size and complexity increase

Engineering Contradiction:
Improvecontact resistanceVSAvoidterminal size and structure
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The oxide-film shaving portion is designed to preliminarily remove oxide films from the contact surface before the indent portion makes contact. This preliminary action reduces the thickness of oxide films in advance, so that when contact pressure is applied, the oxide films are destroyed more efficiently, reducing contact resistance without requiring excessive contact pressure that would increase terminal complexity

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The contact structure is segmented into distinct functional portions: the oxide-film shaving portion (with annular arc portions) that removes oxide films, and the indent portion that provides contact pressure. This segmentation allows each portion to perform its specific function efficiently, reducing contact resistance without requiring the entire terminal structure to be enlarged or complicated

Inventive Principle:
Principle #1Segmentation

2Reliability

If contact pressure is increased to destroy oxide films, then electrical connection is improved, but manufacturing complexity increases

Engineering Contradiction:
Improveelectrical connectionVSAvoidterminal manufacturing
Core Design Contradiction:
ReliabilityVSEase of manufacture

Solution Approach 1:

The oxide-film shaving portion performs preliminary removal of oxide films through its annular arc portions that engage with the oxide layer during insertion. This preliminary action reduces the burden on the contact pressure mechanism, allowing for simpler manufacturing processes that do not require high-precision high-pressure contact structures

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The annular arc portions of the oxide-film shaving portion utilize curved surfaces that naturally concentrate stress on the oxide films during insertion. This geometric design achieves effective oxide film removal through the curvature-induced stress distribution, simplifying the manufacturing process compared to sharp-edged or complex multi-component designs

Inventive Principle:
Principle #14Spheroidality (Curvature)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The proposed structure effectively reduces contact resistance by securely acquiring multiple contact points between plating metals, even at lower contact pressures, facilitating miniaturization and maintaining connection reliability.

Implementation Method 1

the indent portion of the first contact portion slides on a contact surface of the second contact portion

Methodology Applied
Scientific EffectFriction: Friction

Implementation Method 2

the contact load of the indent portion thrusts the oxide film into the plating layer

Methodology Applied
Scientific EffectMechanical Force: Mechanical Force

Data Source

PatentUS9871311B2Contact connection structure for removing oxide buildup
Publication Date: 2018.01.16 YAZAKI CORP
  • US9871311B2 patent drawing
  • US9871311B2 patent drawing
  • US9871311B2 patent drawing

AI summary

A contact connection structure includes: a first contact portion including an indent portion spherically protruding, the first contact portion including a plating layer formed on a surface of the first contact portion; and a second contact portion including a plating layer formed on a surface of the second contact portion. The indent portion of the first contact portion is slidable on a contact surface of the second contact portion. The indent portion of the first contact portion at a terminal insertion completed position is in contact with the second contact portion. The contact surface of the second contact portion includes an oxide-film shaving portion having an annular arc portion curved along a circumference portion of the indent portion.