Electroplating Contact Pin Resistance Detection for Uniform Plating

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Solution Overview

Problem

In semiconductor manufacturing, the complexity of electroplating processes is increased due to the scaling down of semiconductor devices, leading to challenges in achieving uniform metal coatings, as poor contacts between the substrate and contact pins can result in unevenly distributed plated layers, causing performance degradation or substrate damage.

Innovation Solution

An electroplating system equipped with an array of contact detection sensors on the cone, which detects resistance values between the substrate and contact pins, allowing for real-time assessment of contact quality and preventing substrate damage by determining proper contact formation before and during electroplating.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If contact detection sensors are added to detect contact quality, then substrate damage is prevented and plating performance is improved, but device complexity increases

Engineering Contradiction:
Improvesubstrate damage preventionVSAvoidsystem complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The contact detection sensors perform preliminary detection of contact quality between contact pins and substrate before the electroplating process begins. By detecting resistance values in advance and identifying poor contacts, the system prevents substrate damage before it occurs, rather than reacting after damage happens.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The contact detection sensors act as intermediary detection elements between the contact pins and the substrate. They measure resistance values to indirectly assess contact quality without directly interfering with the electroplating process, providing a mediating detection mechanism that prevents damage while maintaining process integrity.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Manufacturing precision

If contact detection sensors are added to detect contact quality, then plating performance is improved, but device complexity increases

Engineering Contradiction:
Improveplating performanceVSAvoidsystem complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The contact detection sensors provide real-time feedback on contact quality by measuring resistance values between contact pins and substrate. This feedback mechanism allows the system to identify poor contacts and adjust or prevent plating operations accordingly, ensuring high plating performance through continuous monitoring and response.

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The system replaces direct mechanical inspection or trial-and-error plating with electrical resistance measurement. By using electrical properties (resistance) to detect contact quality, the system achieves precise manufacturing control without complex mechanical detection apparatus.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

3Measurement precision

If resistance measurement is performed to detect poor contacts, then contact quality is assessed accurately, but measurement precision requirements increase

Engineering Contradiction:
Improvecontact quality detectionVSAvoidresistance measurement difficulty
Core Design Contradiction:
Measurement precisionVSDifficulty of detecting and measuring

Solution Approach 1:

The contact detection sensors utilize the inherent electrical properties of the contact interface itself. The resistance measurement leverages the natural electrical characteristics of the contact between pins and substrate, requiring the system to only measure rather than actively modify or complexly probe the contact interface.

Inventive Principle:
Principle #25Self-service

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The system ensures uniform electroplating by accurately detecting and reporting poor contacts, thereby improving plating performance and preventing substrate damage, ensuring consistent and high-quality metal coatings.

Implementation Method 1

Each contact detection sensor can detect a resistance value for the contact formed between the substrate and a contact pin

Methodology Applied
Scientific EffectElectrical Resistance: Electrical Resistance

Implementation Method 2

electroplating system equipped with an array of contact detection sensors on the cone, which detects resistance values between the substrate and contact pins

Methodology Applied
Scientific EffectElectroplating: Electroplating

Data Source

PatentUS11920254B2Detection of contact formation between a substrate and contact pins in an electroplating system
Publication Date: 2024.03.05 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US11920254B2 patent drawing
  • US11920254B2 patent drawing
  • US11920254B2 patent drawing

AI summary

The present disclosure relates to an electroplating system including a first contact detection sensor and a second contact detection sensor disposed at a surface of a cone of the electroplating system. The first contact detection sensor detects a first resistance at a first contact between a substrate to be plated by the electroplating system and a first contact pin, the second contact detection sensor detects a second resistance at a second contact between the substrate and a second contact pin. A controller receives the first resistance and the second resistance, and determines the first contact and the second contact are not properly formed when a difference between the first resistance and the second resistance is not within a first predetermined resistance range, or the first resistance or the second resistance is not within a second predetermined resistance range.