Contaminant Processing Device for Semiconductor Line Purification

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Solution Overview

Problem

Existing technologies in semiconductor manufacturing struggle to effectively purify and measure particles and chemical gases generated in clean rooms, leading to contamination issues.

Innovation Solution

A contaminant processing device equipped with a purification unit, position sensor, chemical gas detection sensor, particle sensor, and a controller that forms a map of the semiconductor line to monitor and purify contaminants.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a purification unit is installed to remove particles and chemical gases, then contamination control is improved, but device complexity increases

Engineering Contradiction:
Improvecontamination controlVSAvoiddevice complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The purification unit is divided into separate functional modules: a suction fan for drawing in contaminants, a collection unit with filtration elements for removing particles and chemical gases, and sensor units for monitoring. This segmentation allows each component to perform its specific function efficiently while maintaining overall system manageability despite the increased complexity.

Inventive Principle:
Principle #1Segmentation

2Measurement precision

If multiple sensors are installed to measure particles and chemical gases, then measurement precision is improved, but device complexity increases

Engineering Contradiction:
Improvemeasurement precisionVSAvoiddevice complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The particle sensor and chemical gas detection sensor are integrated into the same flow path structure, allowing both sensors to monitor contaminants simultaneously as air flows through the purification unit. This merging of sensing functions within a single structural framework improves measurement precision for multiple contaminant types while minimizing the additional complexity that would result from completely separate sensing systems.

Inventive Principle:
Principle #5Merging (Combining)

3Reliability

If a suction fan and collection unit are added to purify chemical gases, then purification effectiveness is improved, but energy consumption increases

Engineering Contradiction:
Improvepurification effectivenessVSAvoidenergy consumption
Core Design Contradiction:
ReliabilityVSUse of energy by moving object

Solution Approach 1:

The suction fan operates continuously or in sustained intervals to maintain constant negative pressure and ensure continuous flow of air through the collection unit and sensors. This continuous operation ensures that chemical gases and particles are consistently drawn into the purification system and filtered, maintaining high purification effectiveness throughout the semiconductor manufacturing process.

Inventive Principle:
Principle #20Continuity of useful action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The device continuously measures and purifies particles and chemical gases while moving within the semiconductor line, providing real-time data for effective contamination control and reducing human intervention.

Implementation Method 1

a suction fan installed in a first area and sucking in particles and chemical gases

Methodology Applied
Scientific EffectSuction: Suction

Implementation Method 2

a collection unit installed in a second area and filtering the particles and the chemical gases

Methodology Applied
Scientific EffectFiltration: Filter (physical)

Data Source

PatentUS20250170514A1Contaminant processing device
Publication Date: 2025.05.29 SYSTEM ENGINEERING MEGA SOLUTION CO LTD
  • US20250170514A1 patent drawing
  • US20250170514A1 patent drawing
  • US20250170514A1 patent drawing

AI summary

There is provided a contaminant processing device that purifies and measures particles or chemical gases generated in a semiconductor line. The contaminant processing device includes a body unit including different first surface and second surface, a driving unit installed in the body unit and configured to drive inside a semiconductor line, a position sensor installed in the body unit and configured to sense a position within the semiconductor line, a purification unit installed in the body unit and configured to penetrate the first surface and the second surface, wherein the purification unit includes a flow path disposed between the first surface and the second surface, a chemical gas detection sensor installed in the flow path, measuring a chemical gas entering through the first surface and a controller that receives a concentration of the chemical gas from the chemical gas detection sensor, receives position data from the position sensor, and checks the concentration of the chemical gas according to a position within the semiconductor line.