Continuous CdTe Thin Film Deposition System

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Solution Overview

Problem

Current thin film deposition processes for CdTe photovoltaic modules are inefficient for large-scale production due to non-uniformity, material waste, and the need for batch processing, which increases costs and reduces energy conversion efficiency.

Innovation Solution

A continuous vapor deposition system where substrates are conveyed through a vacuum chamber at a controlled speed, with post-heating and cooling sections to maintain a uniform temperature profile and prevent thermal damage, allowing for continuous material supply and uniform film deposition.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If batch processing is used in CSS deposition, then material can be deposited on substrates, but production efficiency is low and material waste increases due to periodic interruptions

Engineering Contradiction:
Improveproduction efficiencyVSAvoidmaterial waste
Core Design Contradiction:
ProductivityVSLoss of substance

Solution Approach 1:

The patent implements a continuous deposition process where substrates are conveyed through the deposition chamber without periodic interruptions. The source material is continuously replenished during substrate conveyance, eliminating batch processing interruptions and maintaining continuous useful action throughout the deposition process, thereby improving productivity and reducing material waste

Inventive Principle:
Principle #20Continuity of useful action

Solution Approach 2:

The patent performs preliminary replenishment of source material before substrates reach the deposition zone. The source material is loaded into the chamber in advance during substrate conveyance, ensuring material availability before deposition begins, which prevents interruptions and maintains continuous production flow

Inventive Principle:
Principle #10Preliminary action

2Ease of manufacture

If substrates are indexed into and out of the deposition chamber, then batch processing is enabled, but significant material waste occurs during indexing and positioning steps

Engineering Contradiction:
Improvebatch processing capabilityVSAvoidmaterial waste during indexing
Core Design Contradiction:
Ease of manufactureVSLoss of substance

Solution Approach 1:

The continuous conveyance system eliminates indexing operations by maintaining constant substrate movement through the chamber. Substrates are fed continuously from a magazine and conveyed through the deposition zone without stopping, eliminating material waste associated with indexing and positioning operations while maintaining ease of manufacture through automated continuous processing

Inventive Principle:
Principle #20Continuity of useful action

Solution Approach 2:

The patent replaces the mechanical indexing system with a continuous conveyance mechanism. Instead of periodically moving substrates in and out of the chamber using indexing operations, the system uses continuous conveyance through the entire chamber, substituting the batch mechanical system with a continuous flow system that eliminates waste during positioning

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

3Productivity

If continuous conveyance is used, then productivity increases and material waste reduces, but uniform temperature profile control becomes more difficult

Engineering Contradiction:
Improvelarge-scale production efficiencyVSAvoidtemperature profile uniformity
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The patent applies different heating zones along the conveyance path to maintain uniform temperature profile. The chamber includes multiple heating elements positioned at different locations (source region, deposition region, downstream region) that can be independently controlled to compensate for temperature variations caused by continuous substrate movement, ensuring each zone maintains optimal temperature for its specific function

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The system dynamically adjusts heating parameters along the conveyance path to maintain uniform temperature profile during continuous operation. Different regions of the chamber are heated to different temperatures based on their specific requirements, and the heating parameters are modified to account for the continuous movement of substrates, ensuring consistent deposition conditions throughout the process

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enables efficient, large-scale production of CdTe photovoltaic modules with reduced material waste and improved energy conversion efficiency by ensuring uniform film deposition and controlled thermal processing.

Implementation Method 1

a thin film of a sublimed source material is deposited onto an upper surface of the substrates

Methodology Applied
Scientific EffectSublimation: Sublimation

Implementation Method 2

vapor deposition apparatus configured for depositing a thin film of a sublimed source material

Methodology Applied
Scientific EffectPhysical vapor deposition: Physical Vapour Deposition

Data Source

PatentUS8481355B2Modular system and process for continuous deposition of a thin film layer on a substrate
Publication Date: 2013.07.09 FIRST SOLAR INC
  • US8481355B2 patent drawing
  • US8481355B2 patent drawing
  • US8481355B2 patent drawing

AI summary

A system and associated process for vapor deposition of a thin film layer on a photovoltaic (PV) module substrate is includes establishing a vacuum chamber and introducing the substrates individually into the vacuum chamber. A conveyor system is operably disposed within the vacuum chamber and is configured for conveying the substrates in a serial arrangement through a vapor deposition apparatus within the vacuum chamber at a controlled constant linear speed. A post-heat section is disposed within the vacuum chamber immediately downstream of the vapor deposition apparatus in the conveyance direction of the substrates. The post-heat section is configured to maintain the substrates conveyed from the vapor deposition apparatus in a desired heated temperature profile until the entire substrate has exited the vapor deposition apparatus.