Continuous Implant Structure for Well Tap Area Reduction
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Solution Overview
Problem
In physical design, especially at advanced process nodes, standard cell libraries face challenges in achieving performance and reliability due to limitations in well and substrate ties, requiring designers to optimize well tap structures within minimal areas, which conventional island-style well taps struggle to meet.
Innovation Solution
Implementing a continuous implant structure instead of conventional island formation for well taps, allowing for a legal and efficient well tap structure that encloses active regions within defined cell boundaries, thereby overcoming minimum implant and active area challenges.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of moving object
If conventional island-style well tap structures are used, then the structure is simple to manufacture, but the area occupied by well tap cells is excessive for high-density standard cell libraries
Solution Approach 1:
The patent merges the P-type implant and N-type implant into a continuous implant structure that spans across the cell boundary, eliminating the need for separate island-style implants. This continuous structure reduces the total area required for well tap cells while maintaining all necessary electrical connections and compliance with design rules.
Solution Approach 2:
The patent extends the implant structure into the adjacent cell region, utilizing space in a different dimensional arrangement. By allowing the implant to continue into the next cell, the structure achieves better space utilization and reduces area occupation within the original cell boundaries.
2Area of moving object
If well tap structures are minimized to meet area requirements, then high-density standard cell libraries are achieved, but sufficient enclosure for active regions becomes difficult to maintain
Solution Approach 1:
The continuous implant structure combines multiple functions into a single unified structure that provides both area efficiency and adequate enclosure. By eliminating gaps between separate implants, the continuous structure ensures proper enclosure of active regions while occupying minimal area.
3Area of moving object
If continuous implant structure is used instead of island formation, then area is reduced and design rules are complied with, but the implant structure becomes more complex
Solution Approach 1:
While the implant is continuous, the patent segments it into distinct regions with different doping types (P-type and N-type) along its length. This segmentation allows the structure to maintain continuity for area efficiency while providing functionally distinct sections that simplify the design and manufacturing process.
Data Source
AI summary
Various implementations described herein are directed to an integrated circuit. The integrated circuit may include a cell having a first region designated for a first type of implant and a second region designated for a second type of implant that is different than the first type of implant. The integrated circuit may include a first implant structure configured to implant the first region with the first type of implant such that the first region extends within a portion of the second region. The integrated circuit may include a second implant structure configured to implant the second region with the second type of implant such that the second region extends within a portion of the first region.