Systems and methods to clean a continuous substrate
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Solution Overview
Problem
Conventional systems for cleaning continuous substrates, such as those used in clean-room applications, face limitations in throughput and the ability to remove particulate matter effectively, often resulting in substrates with high particulate counts.
Innovation Solution
The implementation of a high pressure, low flow spray system combined with an agitator, such as a megasonic or ultrasonic transducer, and a drying mechanism to clean and dry continuous substrates, along with an agitation bath to enhance cleaning efficiency and throughput.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If conventional cleaning systems are used, then the substrate can be cleaned, but the throughput is limited and particulate matter removal is insufficient
Solution Approach 1:
The cleaning system is divided into multiple spray zones with different nozzle configurations (e.g., 45-degree angled nozzles, 90-degree nozzles, counter-rotating nozzles) that sequentially treat different portions of the substrate. This segmentation allows each zone to target specific types of particulate matter, improving overall cleaning effectiveness while maintaining high throughput continuous processing
Solution Approach 2:
The system employs ultrasonic vibration at frequencies of 20-100 kHz to enhance particulate matter removal from the substrate surface. The mechanical vibration disrupts the adhesion between particles and substrate, significantly improving cleaning efficiency without reducing throughput, as the vibration occurs simultaneously during the substrate's passage through the cleaning chamber
2Manufacturing precision
If high flow spray is used to increase cleaning efficiency, then particulate matter is removed better, but cleaning fluid consumption increases
Solution Approach 1:
Different spray zones are configured with nozzles optimized for specific local cleaning needs: 45-degree angled nozzles for initial particulate removal, 90-degree nozzles for thorough cleaning, and counter-rotating nozzles for final polishing. Each zone applies cleaning fluid with appropriate pressure and flow rate locally, maximizing cleaning efficiency while minimizing overall fluid consumption by avoiding uniform high-flow spraying across the entire substrate
Solution Approach 2:
The system varies cleaning fluid parameters (pressure, flow rate, temperature) across different spray zones and adjusts them based on the specific cleaning requirements at each stage. By optimizing these parameters locally rather than using high flow throughout, the system achieves effective particulate removal while reducing total cleaning fluid consumption
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach significantly increases the cleaning efficiency and throughput, ensuring substrates are cleaned to high standards with reduced particulate matter, meeting the requirements for clean-room applications.
Implementation Method 1
applying a high pressure, low flow spray of a first cleaning fluid at the continuous substrate from one or more nozzles to remove particulate matter from the continuous substrate
Implementation Method 2
an agitator, including at least one of a megasonic transducer or an ultrasonic transducer, and configured to direct energy at the continuous substrate
Data Source
AI summary
An example method to clean a continuous substrate involves applying a high pressure, low flow spray of a first cleaning fluid at the continuous substrate from one or more nozzles to remove particulate matter from the continuous substrate; transporting the continuous substrate from a first volume having the high pressure, low volume spray, to a second volume having an agitation bath; vacuuming moisture from the continuous substrate during transporting of the continuous substrate from the first volume to the second volume; directing energy at the continuous substrate in the agitation bath using at least one of a megasonic transducer or an ultrasonic transducer; and drying the continuous substrate.