Systems and methods to clean a continuous substrate

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Solution Overview

Problem

Conventional systems for cleaning continuous substrates, such as those used in clean-room applications, have limited throughput and effectiveness in removing particulate matter, often leaving substrates with excessive particulates and ions.

Innovation Solution

The implementation of a high-pressure, low-flow spray system combined with an agitator, such as a megasonic or ultrasonic transducer, and a drying mechanism to effectively clean and dry continuous substrates, including an agitation bath to remove particulates and ions, while using a reflector plate to enhance energy direction and a vacuum to remove moisture.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If conventional cleaning systems are used, then device complexity is reduced, but productivity and cleaning effectiveness deteriorate

Engineering Contradiction:
ImprovethroughputVSAvoidsystem complexity
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The cleaning system is divided into distinct functional modules: spray modules for applying cleaning fluid, megasonic/ultrasonic modules for agitation, and drying modules. Each module performs a specific cleaning function, allowing the system to achieve high throughput through continuous processing while maintaining manageable complexity through modular design.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The system implements continuous cleaning of substrates through a conveyor-based process where substrates move continuously through spray zones, ultrasonic agitation zones, and drying zones. This continuous operation eliminates idle time between cleaning cycles and maximizes productivity without requiring overly complex batch processing systems.

Inventive Principle:
Principle #20Continuity of useful action

2Manufacturing precision

If conventional cleaning methods are used, then device complexity is low, but manufacturing precision deteriorates due to insufficient particulate removal

Engineering Contradiction:
Improveparticulate removal effectivenessVSAvoidcleaning system complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

Megasonic and ultrasonic transducers generate high-frequency vibrations in the cleaning fluid and substrate to dislodge and remove particulate matter. This mechanical vibration mechanism significantly improves particulate removal effectiveness while adding only moderate complexity through the inclusion of transducer elements in the cleaning path.

Inventive Principle:
Principle #18Mechanical vibration

3Manufacturing precision

If high-pressure spray is applied, then cleaning effectiveness improves, but energy consumption increases

Engineering Contradiction:
Improveparticulate removalVSAvoidenergy consumption
Core Design Contradiction:
Manufacturing precisionVSUse of energy by moving object

Solution Approach 1:

The system replaces purely mechanical high-pressure spray cleaning with a combination of spray and ultrasonic/megasonic field-based cleaning. The ultrasonic and megasonic fields provide the primary agitation and particle removal mechanism, allowing the spray system to operate at lower pressures while achieving equivalent or superior cleaning effectiveness, thereby reducing energy consumption.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach significantly increases the throughput and cleanliness of the substrates, reducing particulate and ion contamination to levels suitable for clean-room applications, with the cleaned substrates showing improved particle removal and lower ion concentrations.

Implementation Method 1

applying a high pressure, low flow spray of a first cleaning fluid at the continuous substrate from one or more nozzles to remove particulate matter from the continuous substrate

Methodology Applied
Scientific EffectHigh-pressure spray: Fluid Spray

Implementation Method 2

an agitator, including at least one of a megasonic transducer or an ultrasonic transducer, and configured to direct energy at the continuous substrate

Methodology Applied
Scientific EffectMegasonic vibration: Ultrasonic Vibration

Implementation Method 3

using a reflector plate to enhance energy direction

Methodology Applied
Scientific EffectAcoustic reflection: Reflection

Implementation Method 4

a vacuum to remove moisture

Methodology Applied
Scientific EffectVacuum suction: Suction

Implementation Method 5

drying the continuous substrate

Methodology Applied
Scientific EffectEvaporation: Evaporation

Data Source

PatentUS20240253091A1Systems and methods to clean a continuous substrate
Publication Date: 2024.08.01 ILLINOIS TOOL WORKS INC
  • US20240253091A1 patent drawing
  • US20240253091A1 patent drawing
  • US20240253091A1 patent drawing

AI summary

An example method to clean a continuous substrate involves applying a high pressure, low flow spray of a first cleaning fluid at the continuous substrate from one or more nozzles to remove particulate matter from the continuous substrate; an agitator, comprising at least one of a megasonic transducer or an ultrasonic transducer, and configured to direct energy at the continuous substrate; and drying the continuous substrate.