Selective Contour Extraction for Charged Particle Beam Image Stitching
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Solution Overview
Problem
The inefficiency in contouring processing arises when forming panorama images, as existing methods require repeated contouring in overlapped regions, leading to redundant processing and decreased efficiency in defect detection and measurement.
Innovation Solution
A method and device for selective contour line extraction, which identifies and prioritizes contouring in areas of significant pattern presence, reducing redundant processing by focusing on necessary portions and optimizing image-capturing regions to minimize joint contours across multiple images.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If contouring processing is carried out separately in each image-capturing region to form panorama images, then high-resolution measurement over wide ranges is achieved, but redundant contouring processing occurs in overlapped regions leading to decreased efficiency
Solution Approach 1:
The patent merges contouring operations by identifying patterns that appear in overlapped regions of multiple image-capturing regions and performing contouring only once for these shared patterns. The system determines whether a pattern in an overlapped region has already been contoured in a previous image region, and if so, reuses the existing contour data instead of performing redundant contouring processing.
Solution Approach 2:
The patent applies different processing strategies to different regions: in non-overlapped regions, full contouring processing is performed, while in overlapped regions, the system checks for existing contour data and selectively performs contouring only when necessary. This local differentiation optimizes processing efficiency by avoiding redundant operations in specific regions while maintaining comprehensive coverage.
2Measurement precision
If multiple images are overlapped to form synthesized images for wide-range measurement, then high-resolution panoramization is achieved, but the same patterns are contoured multiple times in overlapped regions
Solution Approach 1:
The patent performs preliminary identification of overlapped regions and their containing patterns before executing contouring operations. By determining in advance which patterns appear in multiple image regions and establishing a processing sequence, the system avoids redundant contouring and reduces overall processing time while maintaining measurement precision.
Solution Approach 2:
The patent uses contour data from one image region as a copy for other regions where the same pattern appears. When a pattern is identified in an overlapped region and contour data already exists from a previous region, the system copies or references the existing contour data instead of regenerating it, thereby eliminating redundant processing.
3Reliability
If contouring is performed four times in regions where four images are overlapped, then complete pattern coverage is achieved, but processing efficiency deteriorates due to unnecessary repeated processing
Solution Approach 1:
The patent discards redundant contouring operations by identifying and eliminating repeated processing of the same patterns in overlapped regions. The system tracks which patterns have already been contoured and recovers processing time by skipping unnecessary operations, thereby improving efficiency while maintaining complete pattern coverage through strategic selection of which regions to process.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances measurement and inspection efficiency by suppressing unnecessary contouring and focusing on critical areas, thereby improving the accuracy and speed of defect detection and pattern measurement.
Implementation Method 1
images obtained by means of charged particle beam device
Data Source
AI summary
The present invention is intended to provide a contour extraction method and a contour extraction device with an objective of either suppression of unnecessary contouring processings or selective contouring of necessary portions. To attain the objective, provided are a contour extraction method, and a device, with which contours of pattern edges on an image formed based on charged particles emitted from a sample are extracted and, when contouring of a pattern located in an overlapping region provided in connecting images of plural image-capturing regions to form a synthesized image is performed, either areas of the pattern in the plurality of image-capturing regions, or a pre-set measurement portion is found, and selective contour extraction of the pattern with respect to an image of an image-capturing region is carried out either on a side where the area is large, or on a side where a measurement portion regarding the pattern is located.