Control Device for Laminated Film Formation
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Solution Overview
Problem
In semiconductor manufacturing, forming a laminated film with specific properties is challenging due to the complexity of adjusting film formation conditions, especially when the difference in properties between the films is small, making it difficult to measure film thickness and determine optimal conditions for both films in the laminated state.
Innovation Solution
A control device that includes a recipe memory unit for storing film formation conditions and a model memory unit for process models, allowing the controller to adjust the second film formation condition based on measured properties and determine if the first film formation condition needs adjustment to achieve the target properties of the laminated film.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If film formation conditions are adjusted manually based on operator knowledge, then film properties can be optimized, but the process becomes complex and difficult for operators with limited experience
Solution Approach 1:
The control device automatically calculates optimal film formation conditions using stored process models and measured values, enabling the system to self-optimize without requiring operator expertise. The controller computes adjusted film formation conditions based on the relationship between process parameters and film properties, eliminating the need for manual adjustment by experienced operators.
Solution Approach 2:
The system measures actual film properties after formation and uses these measured values as feedback to automatically adjust film formation conditions. The controller compares measured film properties with target values and iteratively optimizes process parameters using stored process models, creating a closed-loop control system that continuously improves film quality.
2Manufacturing precision
If multiple film formation conditions are adjusted simultaneously, then laminated film properties can be optimized, but the number of adjustments and system complexity increases
Solution Approach 1:
The control device divides the optimization process into segments by storing separate process models for different films in the laminated structure. Each process model represents the relationship between film formation conditions and properties for a specific film layer, allowing the system to independently analyze and adjust conditions for each layer while considering their combined effect on the laminated film.
Solution Approach 2:
The system pre-stores process models that represent the relationships between film formation conditions and film properties before actual film formation. These models are prepared in advance and used by the controller to calculate optimal conditions, eliminating the need for complex real-time adjustments during the film formation process.
3Manufacturing precision
If precise measurement of film thickness is performed, then optimal film formation conditions can be determined, but measurement becomes difficult when film property differences are small
Solution Approach 1:
The control device uses process models as intermediaries to relate film formation conditions to film properties without requiring direct measurement of difficult-to-distinguish film thicknesses. The process models mathematically represent the relationships between process parameters and film properties, allowing the system to determine optimal conditions through calculation rather than direct measurement of the laminated film structure.
Solution Approach 2:
The system replaces physical measurement methods with computational modeling to determine film properties. Instead of relying on direct measurement techniques that struggle when film property differences are small, the controller uses stored process models and measured values to calculate film properties and optimize formation conditions through mathematical relationships.
Data Source
AI summary
Disclosed is a control device that controls an operation of a substrate processing apparatus that forms a laminated film by forming a first film on a substrate and then forming a second film. The control device includes a recipe memory unit storing first and second film formation conditions to form the first and second films, a model memory storing first and second process models that represent the effects of the first film formation conditions on the properties of the first and second films, and a controller configured to: adjust the second film formation condition based on a measured value of a property of the laminated film formed by the first and second film formation conditions, and the second process model stored in the model memory unit; and determine whether or not to adjust the first film formation condition based on an expected value of the property of the laminated film.