Substrate Processing Control Twin for Software Update Validation
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Solution Overview
Problem
Existing software update methods for lithography apparatuses face challenges in ensuring accurate testing and functionality due to differences in input data and timing between actual and simulation environments, leading to potential software malfunction and downtime.
Innovation Solution
A substrate processing system with two control apparatuses, one controlling the substrate processing apparatus and the other performing the same calculation processing, using distributors to synchronize signals and allow comparison of processing results to validate software updates without affecting the actual apparatus operation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If software is updated on the operating lithography apparatus, then new functions and improved hardware performance are achieved, but the software may not work properly and the update must be stopped
Solution Approach 1:
The patent creates a copy of the control apparatus (virtual control apparatus) that replicates the functionality of the original control apparatus. This virtual copy runs simulation software that processes the same input data and timing information as the actual control apparatus, allowing software updates to be tested in a virtual environment before being deployed to the operating system, thus preventing potential malfunctions.
Solution Approach 2:
The patent implements preliminary testing of software updates by processing the same input data through both the original control apparatus and the virtual control apparatus with the updated software. This preliminary comparison allows verification of software correctness before actual deployment, preventing faulty software from being installed on the operating lithography apparatus.
2Loss of time
If software updates are tested using simulators, then testing can be performed in advance, but it is difficult to obtain equivalent environmental information and testing accuracy is compromised
Solution Approach 1:
Instead of using traditional simulators that require equivalent environmental information, the patent creates a virtual control apparatus that is a direct copy of the actual control apparatus software. This virtual copy receives identical input data and timing information from the lithography apparatus, ensuring testing accuracy matches the actual operating environment while allowing parallel testing without downtime.
Solution Approach 2:
The virtual control apparatus serves multiple functions: it acts as a testbed for software updates, a validation environment for comparing processing results, and a backup control system. This multi-functionality eliminates the need for separate testing environments while maintaining testing accuracy.
3Reliability
If actual user data is uploaded to the cloud for software debugging, then debugging can be performed in a more realistic environment, but testing cannot be performed using the same input data and timing
Solution Approach 1:
The patent introduces distributors as intermediary components that receive input data and timing information from the lithography apparatus and distribute identical copies to both the control apparatus and the virtual control apparatus simultaneously. This intermediary mechanism ensures that both systems process exactly the same data at the same timing, eliminating information loss and ensuring synchronized testing.
4Device complexity
If input data timing and synchronization are not guaranteed between control apparatus and simulation apparatus, then system complexity is reduced, but testing accuracy and reliability deteriorate
Solution Approach 1:
The distributor acts as an intermediary that automatically synchronizes input data and timing information to both the control apparatus and virtual control apparatus. This intermediary component handles the complexity of synchronization internally, maintaining simple system configuration from the user perspective while ensuring precise test condition accuracy through automatic data distribution and timing alignment.
Data Source
AI summary
A substrate processing system includes a substrate processing apparatus, an input/output apparatus, a first control apparatus installed with first software, configured to control the substrate processing apparatus based on a first signal output from the input/output apparatus, and configured to acquire a second signal output from the substrate processing apparatus, a second control apparatus installed with second software, and configured to perform same calculation processing as that of the first control apparatus, and not configured to control the substrate processing apparatus, a first distributor configured to distribute the first signal to the second control apparatus, and a second distributor configured to distribute the second signal to the second control apparatus. The second control apparatus outputs a third signal based on the first signal and the second signal.