Convex Shielding Element for Particle Beam Apparatus

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Solution Overview

Problem

Existing particle beam-based apparatuses for analyzing and processing lithography masks face challenges with high spatial resolution due to uncontrolled beam deflection caused by charging of non-conductive samples, and process gas reactivity leading to reduced apparatus longevity and processing speed.

Innovation Solution

An apparatus with a shielding element made of electrically conductive material, featuring a convex section to minimize electric field interference and a gas feed system that reduces gas flow into the particle beam apparatus, ensuring high resolution and efficient processing.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If a shielding element is placed close to the sample to minimize charging effects, then beam deflection control improves, but the distance between the shielding element and sample must be kept very small which increases positioning complexity

Engineering Contradiction:
Improveprocess resolutionVSAvoidpositioning complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The shielding element features a convex section that curves toward the sample stage, creating a natural gap between the shielding element and sample. This curved geometry allows the shielding element to be positioned close to the sample for effective charging mitigation while maintaining a sufficient distance to simplify positioning requirements and reduce mechanical complexity.

Inventive Principle:
Principle #14Spheroidality (Curvature)

2Productivity

If process gas pressure at the processing position is increased to improve processing speed, then productivity increases, but more process gas flows into the particle beam apparatus which reduces component longevity

Engineering Contradiction:
Improveprocessing speedVSAvoidservice interval
Core Design Contradiction:
ProductivityVSDuration of action of stationary object

Solution Approach 1:

The gas feed system is designed to deliver process gas locally to the processing position through the convex section region, rather than allowing uniform gas distribution throughout the apparatus. This localized gas delivery enables high processing speed at the sample position while minimizing the overall gas flow into the particle beam apparatus, thereby extending component service intervals.

Inventive Principle:
Principle #3Local quality

3Productivity

If process gas is fed through the exit opening of the particle beam to achieve high processing speed, then productivity improves, but gas flow into the particle beam apparatus increases which reduces component longevity

Engineering Contradiction:
Improveprocessing speedVSAvoidcomponent longevity
Core Design Contradiction:
ProductivityVSReliability

Solution Approach 1:

The gas feed system extracts the process gas delivery function from the particle beam exit opening and relocates it to the convex section region. This separation allows high processing speed to be achieved through localized gas delivery at the processing position, while preventing excessive gas flow into the particle beam apparatus that would reduce component longevity.

Inventive Principle:
Principle #2Taking out (Extraction)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution enhances the spatial resolution and processing speed while extending the lifespan of the apparatus by minimizing electric field interference and optimizing gas flow, allowing for precise control of the particle beam and efficient processing.

Implementation Method 1

a shielding element for shielding an electric field generated by charges accumulated on the sample

Methodology Applied
Scientific EffectElectric field shielding: Faraday Cage

Implementation Method 2

Appropriate apparatuses for this purpose activate local etching or deposition processes on the basis of particle beam-induced processes

Methodology Applied
Scientific EffectParticle beam-induced chemical processes: Ion Beam

Data Source

PatentUS20230238209A1Apparatus for analyzing and/or processing a sample with a particle beam and method
Publication Date: 2023.07.27 CARL ZEISS SMT GMBH
  • US20230238209A1 patent drawing
  • US20230238209A1 patent drawing
  • US20230238209A1 patent drawing

AI summary

An apparatus for analyzing and/or processing a sample with a particle beam, comprising:a sample stage for holding the sample;a providing unit for providing the particle beam comprising:an opening for guiding the particle beam to a processing position on the sample; anda shielding element for shielding an electric field generated by charges accumulated on the sample;wherein the shielding element covers the opening, is embodied in sheetlike fashion and comprises an electrically conductive material;wherein the shielding element comprises a convex section, this section being convex in relation to the sample stage; andwherein the convex section has a through opening for the particle beam to pass through to the sample.