Copper Back-End-of-Line Interconnect for RF Integration

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Solution Overview

Problem

The integration of high-Q passive devices and compound semiconductor transistors in mobile RF transceivers is challenging due to the high cost and thermal conductivity limitations of gold back-end-of-line interconnect layers, which are expensive and inadequate for supporting high frequencies.

Innovation Solution

Replacing the gold back-end-of-line interconnect layer with a copper layer in the integrated compound semiconductor circuit, which reduces costs and enhances thermal conductivity, enabling efficient integration of high-Q inductors and transistors while supporting higher frequencies.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a gold back-end-of-line interconnect layer is used, then reliability and electrical conductivity are improved, but cost increases and thermal conductivity is insufficient for high frequencies

Engineering Contradiction:
Improveinterconnect reliabilityVSAvoidmanufacturing cost
Core Design Contradiction:
ReliabilityVSEase of manufacture

Solution Approach 1:

The patent changes the material parameter of the back-end-of-line interconnect layer from gold to copper, which has superior thermal conductivity and lower cost. This parameter change resolves the contradiction by providing adequate thermal performance for high-frequency operation while significantly reducing manufacturing cost.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent employs a composite interconnect structure with multiple layers including copper, tungsten, and barrier layers. This composite approach allows optimization of individual layer properties to achieve both cost-effectiveness and required electrical/thermal performance for high-frequency RF applications.

Inventive Principle:
Principle #40Composite materials

2Reliability

If a gold back-end-of-line interconnect layer is used, then electrical conductivity is improved, but thermal conductivity is insufficient for supporting high frequencies

Engineering Contradiction:
Improvehigh frequency supportVSAvoidthermal conductivity
Core Design Contradiction:
ReliabilityVSTemperature

Solution Approach 1:

The patent changes the material parameter from gold to copper, which has approximately 40% higher thermal conductivity. This enables effective heat dissipation at high frequencies while maintaining electrical conductivity requirements for RF performance.

Inventive Principle:
Principle #35Parameter changes

3Adaptability or versatility

If compound semiconductor transistors and passive devices are integrated, then device functionality is improved, but integration complexity increases

Engineering Contradiction:
Improvedevice functionalityVSAvoidintegration complexity
Core Design Contradiction:
Adaptability or versatilityVSDevice complexity

Solution Approach 1:

The patent merges compound semiconductor transistors and passive devices into a single integrated RF front-end module. This consolidation improves device functionality by enabling complex RF signal processing while the standardized integration process manages the complexity through unified fabrication and interconnect approaches.

Inventive Principle:
Principle #5Merging (Combining)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The copper back-end-of-line interconnect layer reduces costs and improves thermal conductivity, enabling efficient integration of high-Q inductors and transistors, addressing the limitations of gold interconnects and supporting higher frequencies in RF applications.

Implementation Method 1

copper interconnect layer... improves thermal conductivity

Methodology Applied
Scientific EffectThermal conduction: Conduction (thermal)

Implementation Method 2

back-end-of-line interconnect layer electrically contacting the high-Q inductor device and the compound semiconductor transistor

Methodology Applied
Scientific EffectElectrical conduction: Conduction (electrical)

Data Source

PatentUS20180247933A1Compound semiconductor transistor and high-q passive device single chip integration
Publication Date: 2018.08.30 QUALCOMM INC
  • US20180247933A1 patent drawing
  • US20180247933A1 patent drawing
  • US20180247933A1 patent drawing

AI summary

An integrated compound semiconductor circuit including a high-Q passive device may include a compound semiconductor transistor. The integrated compound semiconductor circuity may also include a high-Q inductor device. The integrated compound semiconductor may further include a back-end-of-line interconnect layer electrically contacting the high-Q inductor device and the compound semiconductor transistor, the back-end-of-line interconnect layer comprising a gold base layer and a copper interconnect layer.