Core-Shell Polishing Particles for Cerium Oxide Distribution
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Solution Overview
Problem
Existing polishing materials using cerium oxide face challenges with uneven distribution, low polishing rate, and durability issues due to pressure-induced damage during the polishing process.
Innovation Solution
A method for producing polishing material particles with a two-layer structure, where an inner layer of yttrium oxide and an outer layer of cerium oxide are formed through a controlled precipitation process, optimizing the composition ratio of cerium oxide to achieve high durability and polishing rate while reducing the amount of cerium oxide used.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If cerium oxide is used as polishing material, then polishing rate and surface flatness are improved, but cerium oxide is unevenly distributed and not stably supplied
Solution Approach 1:
The invention uses a composite structure with a core layer made of silicon oxide or aluminum oxide and a shell layer made of cerium oxide particles bonded with a binder. This composite structure allows the use of less cerium oxide while maintaining polishing performance, thereby addressing the supply stability issue.
2Quantity of substance
If cerium oxide is bonded with binder to reduce cerium oxide amount, then cerium oxide usage is reduced, but polishing rate becomes low
Solution Approach 1:
The invention creates a layered structure where the shell layer containing cerium oxide particles is positioned on the outer surface of the core layer. This local concentration of cerium oxide at the polishing interface maintains high polishing rate while reducing overall cerium oxide content in the composite particle.
3Force
If pressure is applied to polishing material particle, then friction force is generated for polishing, but particle itself is damaged over time
Solution Approach 1:
The invention divides the polishing material particle into a core layer and a shell layer. The core layer made of silicon oxide or aluminum oxide serves as a durable support structure that withstands compression pressure, while the shell layer with cerium oxide particles provides the necessary friction force for polishing.
4Shape
If element other than cerium is mixed on particle surface, then particle shape and size distribution are adjusted, but polishing rate becomes low
Solution Approach 1:
The invention uses a core-shell composite structure where the core layer is made of silicon oxide or aluminum oxide and the shell layer contains cerium oxide particles bonded with a binder. This structure allows for controlled particle shape and size distribution without mixing other elements on the surface, thereby maintaining high polishing rate.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method results in polishing material particles with high durability and polishing rate, maintaining surface flatness and precision while minimizing cerium oxide usage, effectively addressing the limitations of traditional cerium oxide-based polishing materials.
Implementation Method 1
adding for a predetermined amount of time an aqueous solution prepared with a salt of at least one element selected from the group consisting of Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Zr, In, Sn, Y, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, W, Bi, Th, and alkali earth metals and a salt of Ce in a reaction solution in which the salt of the element formed in the inner layer forming is dispersed, and forming an outer layer of the precursor of the polishing material particle on an outer side of the inner layer
Implementation Method 2
baking the precursor of the polishing material particle obtained in the separating in the air or in an oxidizing atmosphere
Data Source
AI summary
A production method for polishing-material particles, comprising: forming an inner layer having, as a main component thereof, a salt of at least one element selected from Al, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, Zr, In, Sn, Y, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, W, Bi, Th, and the alkali earth metals; adding a prepared aqueous solution, at a prescribed time, to a reaction solution in which the salt formed from the element is dispersed, to form an outer layer on the outer side of the inner layer; using solid-liquid separation to separate a polishing-material-particle precursor from the reaction solution, and the polishing-material-particle precursor is baked; and the percentage of Ce in the reaction solution in which the surface of the outer layer is formed is in the range of 60-90 mol % inclusive.