Correction Plate for Charged-Particle Multi-Beam Defect Compensation
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Solution Overview
Problem
Charged-particle multi-beam processing systems, such as those used in nanopatterning and semiconductor lithography, face defects in deflection devices that result in 'always-on' beamlets, which cannot be effectively compensated, leading to unwanted exposure and reduced productivity.
Innovation Solution
A programmable filtering device, known as a correction plate, is introduced across the aperture array field to divert 'always-on' beamlets from their nominal paths, converting them into 'always-off' defects, which are easier to compensate, by using electrostatic electrodes to obstruct the beamlets' path downstream of the pattern definition device.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If deflection devices are used to control beamlet paths, then beamlet deflection capability is improved, but device reliability deteriorates due to 'always-on' defects
Solution Approach 1:
A correction plate is introduced as an intermediary component between the aperture array plate and the target. This correction plate carries obstructing devices that act as mediators to block 'always-on' beamlets, thereby resolving the reliability issue without affecting the deflection capability of the original deflection devices
Solution Approach 2:
The system is segmented into multiple functional plates: aperture array plate, deflection array plate, and correction plate. Each plate performs a specific function, allowing the deflection devices to maintain their adaptability while the correction plate separately handles the reliability issue by blocking defective beamlets
2Device complexity
If 'always-on' beamlets are allowed to pass through the system, then device complexity is reduced, but manufacturing precision deteriorates due to unwanted exposure
Solution Approach 1:
The problematic 'always-on' beamlets are extracted from the useful beamlet group by the obstructing devices on the correction plate. This separation allows the system to maintain simplicity while removing the harmful elements that degrade manufacturing precision
Solution Approach 2:
The 'always-on' defects, which were harmful causing unwanted exposure, are converted into a manageable situation by using obstructing devices to deliberately block them. The harm is transformed into a controlled configuration where defective beamlets are intentionally diverted to safe paths
3Device complexity
If defective deflection devices are not compensated, then device complexity remains low, but productivity deteriorates due to reduced system reliability
Solution Approach 1:
The correction plate is configured in advance to compensate for known defective deflection devices. By pre-programming the obstructing devices to block specific 'always-on' beamlets, the system proactively prevents productivity loss without requiring complex real-time compensation mechanisms
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution significantly reduces the number of defective deflection devices by converting 'always-on' defects into 'always-off' defects, improving system reliability and productivity by ensuring all beamlets can be properly controlled, thereby enhancing the accuracy and efficiency of pattern exposure.
Implementation Method 1
each of said deflection devices being associated with a respective blanking opening and comprising at least one electrostatic electrode, the deflection devices being selectively activatable and configured to influence, when activated, the beamlets traversing said respective blanking openings so as to deflect said beamlets
Implementation Method 2
at least one electrostatic electrode, the deflection devices being selectively activatable and configured to influence, when activated, the beamlets traversing said respective blanking openings so as to deflect said beamlets by an amount sufficient to divert said beamlets off their nominal paths
Data Source
Figure 1
Figure 2~4
Figure 5~6A
AI summary
In a pattern definition device (7) for a charged-particle multi-beam processing or inspection apparatus comprises a deflection array device (52) with an aperture array field for blanking a plurality of beamlets. The deflection array device comprises a plurality of deflection devices (521, 501), each associated with a respective opening (520) and comprising at least one electrostatic electrode (522, 523, 502) for deflecting, when activated, the beamlet traversing the opening off its nominal path. However, one or more deflection devices (501) may be defective, permanently unable to deflect their respective beamlets (b'). To correct these "non-deflected beamlets" (b') the pattern definition device (7) comprises a filtering device (53) having openings (70) allowing passage of beamlets where the respective deflection devices (521) are operative, and at least one obstructing device (71, 74) which is programmable to permanently assume an obstructing state (74) where it prevents the respective non-deflected beamlets (b') from traversing the pattern definition device (7) along their respective nominal paths downstream of the pattern definition device.