Counterflow Sample Introduction for Plasma Torch Background Signal Reduction

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Solution Overview

Problem

Existing plasma-based analytical devices face challenges in introducing samples efficiently, leading to increased background signal and reduced sensitivity due to desolvation, which affects the overall performance of these devices.

Innovation Solution

A system and method where a sample is introduced into a plasma torch in a direction opposite to the plasma gas flow, utilizing a counter-flow sample plasma (CFSP) device, which includes a torch configured to sustain a plasma and a sample introduction device fluidically coupled to it, allowing for efficient drying and improved detection limits.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If a sample is introduced into a plasma torch in the conventional direction (same as plasma gas flow), then the sample can be introduced efficiently, but the background signal increases and sensitivity decreases due to desolvation

Engineering Contradiction:
Improvedetection sensitivityVSAvoidbackground signal
Core Design Contradiction:
Measurement precisionVSObject-generated harmful factors

Solution Approach 1:

The patent inverts the conventional sample introduction direction by introducing the sample flow in the opposite direction to the plasma gas flow. This counter-flow configuration allows the sample to be introduced efficiently while reducing background signal and enhancing detection sensitivity, as the sample undergoes efficient drying before ionization without the harmful desolvation effects of conventional co-flow introduction

Inventive Principle:
Principle #13The other way round (Inversion)

2Productivity

If a sample is introduced into a plasma torch, then analysis can be performed, but desolvation increases background signal which reduces overall sensitivity

Engineering Contradiction:
Improveanalysis efficiencyVSAvoiddetection sensitivity
Core Design Contradiction:
ProductivityVSMeasurement precision

Solution Approach 1:

The patent applies inversion by reversing the sample introduction direction relative to plasma gas flow. This counter-flow approach maintains analysis efficiency while eliminating the desolvation-induced background signal increase, thereby improving detection sensitivity without sacrificing productivity

Inventive Principle:
Principle #13The other way round (Inversion)

Solution Approach 2:

The patent implements preliminary action by efficiently drying the sample before it enters the plasma ionization zone. The counter-flow configuration allows the sample to undergo preliminary drying in the opposing flow direction, preparing it for optimal ionization and detection while avoiding subsequent desolvation problems

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach reduces background signal and enhances detection limits by efficiently drying the sample before ionization, improving the overall sensitivity and performance of analytical devices.

Implementation Method 1

A plasma may be used to ionize and/or atomize a sample

Methodology Applied
Scientific EffectIonization: Ionisation

Implementation Method 2

The plasma is also used to desolvate the sample after it is introduced into the plasma

Methodology Applied
Scientific EffectEvaporation: Evaporation

Data Source

PatentUS10327319B1Counterflow sample introduction and devices, systems and methods using it
Publication Date: 2019.06.18 PERKINELMER U S LLC
  • US10327319B1 patent drawing
  • US10327319B1 patent drawing
  • US10327319B1 patent drawing

AI summary

Devices, systems and methods using counterflow sample introduction are described. In certain examples, the devices, systems and methods may be configured to introduce a fluid flow comprising a sample into a torch comprising a plasma in a direction that opposes the flow of a gas used to sustain the plasma. Optical emission devices, optical absorption devices and mass spectrometers using the counterflow sample introduction are also described.