Coupling Prevention Elements for Array Antenna
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Solution Overview
Problem
Existing plasma processing apparatuses face inefficiencies due to electromagnetic coupling between antennas, leading to power loss and reduced plasma generation efficiency.
Innovation Solution
The implementation of coupling prevention elements, functioning as meta-materials, is introduced between antennas to suppress electromagnetic coupling, ensuring that microwave power is effectively radiated into the plasma processing chamber without significant loss.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If antennas are arranged closely to increase plasma generation efficiency, then plasma density can be improved, but electromagnetic coupling between antennas increases causing power loss
Solution Approach 1:
A coupling prevention element is introduced as an intermediary component between adjacent antennas. This element includes a first member connected to a ground surface and a second member connected to the tip end of the first member, forming a capacitive structure that prevents electromagnetic coupling between antennas while allowing the antennas to be arranged closely for effective plasma generation
Solution Approach 2:
The coupling prevention element is segmented into two distinct members (first member and second member) separated by a gap, creating a capacitive structure that blocks electromagnetic coupling between antennas while maintaining spatial compactness for high plasma generation efficiency
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution significantly reduces electromagnetic coupling, allowing for more efficient plasma generation by minimizing power loss and enhancing the uniformity and control of plasma density distribution.
Implementation Method 1
each of the coupling prevention elements includes: a first member connected to a ceiling wall which is a ground surface in the chamber; and a second member connected to a tip end of the first member or a vicinity of the tip end of the first member
Data Source
AI summary
An array antenna radiates an electromagnetic wave into a chamber of a plasma processing apparatus. The array antenna includes antennas and coupling prevention elements arranged at intervals between the antennas. Each of the coupling prevention elements includes a first member connected to a ceiling wall which is a ground surface in the chamber and a second member connected to a tip end of the first member or a vicinity of the tip end of the first member.