Antimicrobial treatment of substrates
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Solution Overview
Problem
Existing antimicrobial substrates face challenges in achieving high antimicrobial efficiency, self-disinfecting capabilities, and low-leaching properties, with previous methods failing to provide sufficient killing rates and stable attachment of antimicrobial agents.
Innovation Solution
Treating substrates with METAC monomers to create a highly positively charged surface, allowing for dense and uniform binding, which enhances antimicrobial activity and reduces leaching by using an initiator to facilitate a binding reaction, such as UV light or heat, to adhere METAC monomers covalently to the substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If antimicrobial agents are attached to substrate surface, then antimicrobial performance is improved, but leaching increases and reliability decreases
Solution Approach 1:
The patent replaces physical adsorption (mechanical attachment) with covalent bonding (chemical attachment) by using radiation-induced grafting to form permanent chemical bonds between the substrate and antimicrobial monomers, eliminating leaching while maintaining antimicrobial efficacy
Solution Approach 2:
The patent creates a composite material system where radiation-induced grafted polymer chains containing quaternary ammonium groups are covalently bonded to the substrate matrix, forming a stable composite structure that prevents agent release while providing sustained antimicrobial activity
2Reliability
If high concentration of antimicrobial agents is applied, then antimicrobial activity is improved, but toxicity increases
Solution Approach 1:
The patent changes the chemical structure parameter by selecting quaternary ammonium monomers with specific alkyl chain lengths (C12-C18) that optimize the balance between antimicrobial potency and biocompatibility, achieving high activity while maintaining safety through controlled molecular parameters
Solution Approach 2:
The patent concentrates antimicrobial functionality at the substrate surface through radiation-induced grafting, creating a localized high-density layer of active groups that provides potent antimicrobial action at the interface while minimizing bulk material toxicity and systemic exposure
3Duration of action of stationary object
If self-disinfecting capability is achieved, then duration of action is improved, but manufacturing complexity increases
Solution Approach 1:
The patent enables the substrate to autonomously provide antimicrobial protection through permanently grafted functional groups that continuously exhibit biocidal activity without requiring external application or activation, achieving self-disinfecting capability through one-time manufacturing processing
Solution Approach 2:
The patent incorporates antimicrobial functionality during the substrate manufacturing process itself through radiation-induced grafting, pre-establishing the protective function before the substrate enters service, thereby achieving long-duration performance through integrated initial processing rather than complex ongoing systems
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method achieves high antimicrobial activity, with substrates demonstrating over 5 log kill rates within short times and low leaching, ensuring effective self-disinfecting properties without releasing toxic agents.
Implementation Method 1
triggering a binding reaction between the substrate and the METAC monomer... the initiator facilitates triggering a reaction between the substrate and the METAC monomer, such as UV light or heat
Data Source
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AI summary
The present invention relates generally to an antimicrobial treatment of substrates. In particular it relates to a method for rendering a substrate antimicrobial, preferably self-disinfecting, a substrate that can be obtained by such a method, an antimicrobial or preferably self-disinfecting substrate, and the use of a chemical for rendering a substrate antimicrobial or preferably self-disinfecting.