Cover Window Groove Etching for Foldable Display Flexibility
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Solution Overview
Problem
Existing etching technologies face challenges in efficiently creating a cover window for foldable display devices that allows smooth folding and unfolding while maintaining structural integrity and display quality.
Innovation Solution
An etching system and method that includes movable etching area selection portions to selectively apply etching material, forming a groove structure in the cover window with varying thickness to enhance flexibility and impact resistance, without using separate photoresist materials.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Strength
If a cover window with varying thickness is created using conventional etching technology, then flexibility and impact resistance are improved, but manufacturing complexity and process time increase due to the need for separate photoresist materials and multiple processing steps
Solution Approach 1:
The patent extracts and removes the separate photoresist material step from the conventional etching process. Instead of applying photoresist, performing photolithography, and then etching, the invention directly patterns the etching mask using a printing process that integrates mask formation and etching into a single step, thereby simplifying the manufacturing process while achieving the same protective function.
Solution Approach 2:
The patent merges the mask formation step and the etching step into a single integrated process. The printing process directly deposits etching-resistant material in the desired pattern while simultaneously defining the etching areas, eliminating the need for separate photoresist application, exposure, and development steps that would otherwise be required.
2Strength
If a cover window with varying thickness is created using conventional etching technology, then flexibility and impact resistance are improved, but production time and cost increase due to multiple processing steps
Solution Approach 1:
The patent extracts and removes the separate photoresist material step from the conventional etching process. Instead of applying photoresist, performing photolithography, and then etching, the invention directly patterns the etching mask using a printing process that integrates mask formation and etching into a single step, thereby simplifying the manufacturing process while achieving the same protective function.
Solution Approach 2:
The patent performs the mask pattern formation in advance as part of the printing process before the etching step begins. By pre-defining the etching-resistant areas through direct printing, the process eliminates subsequent photoresist application and development steps, allowing the etching process to proceed immediately with the pre-patterned mask already in place.
3Stability of the object's composition
If conventional etching technology is used to create a cover window, then structural integrity is maintained, but distortion and defects increase due to over-etching and improper thickness control
Solution Approach 1:
The patent implements a feedback mechanism where the printing process parameters (such as deposition amount, pattern geometry, and material properties) are controlled to precisely define the mask areas. This feedback control ensures that the etching process stops at the correct depth, preventing over-etching and achieving the desired varying thickness profile with high precision and minimal distortion.
Solution Approach 2:
The patent applies local quality by creating spatially varying etching-resistant patterns through the printing process. Different areas of the cover window receive different amounts of etching-resistant material or different pattern densities, allowing precise local control of the etching depth and achieving the desired varying thickness distribution across different regions of the cover window.
4Ease of operation
If the cover window thickness is reduced in certain areas to enable smooth folding, then flexibility is improved, but structural strength and impact resistance decrease
Solution Approach 1:
The patent applies local quality by creating spatially varying etching-resistant patterns through the printing process. Different areas of the cover window receive different amounts of etching-resistant material or different pattern densities, allowing precise local control of the etching depth and achieving the desired varying thickness distribution across different regions of the cover window.
Solution Approach 2:
The patent segments the cover window into different functional zones with different thickness requirements. The printing process creates distinct pattern regions that correspond to areas requiring different flexibility and strength characteristics, allowing the cover window to be optimized for both folding flexibility in certain areas and impact resistance in other areas.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enables the production of a cover window with improved flexibility, impact resistance, and reduced distortion, while minimizing process costs and defects, ensuring high display quality and durability.
Implementation Method 1
a nozzle to provide an etching material toward the etching target
Data Source
AI summary
An etching system and an etching method using the etching system are disclosed. The etching system may include an etching target including a first etching protection area, a second etching protection area, and an etching target area between the first etching protection area and the second etching protection area, a nozzle to provide an etching material toward the etching targe, a first etching area selection portion which is between the etching target and the nozzle and overlaps the first etching protection area in plan view, and a second etching area selection portion which is between the etching target and the nozzle and overlaps the second etching protection area in plan view. The first etching area selection portion and the second etching area selection portion may be provided to be relatively movable in a direction away from each other.