Cover Window Edge Rounding via Laser-Guided Etching
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Solution Overview
Problem
Existing methods for manufacturing cover windows in display devices lack precision, leading to increased manufacturing costs and defect rates.
Innovation Solution
A cover window manufacturing system utilizing a laser irradiation apparatus and etching apparatus to precisely process a substrate, controlling the focal point of a laser beam and immersing the substrate in an etching solution to form a round edge.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional manufacturing methods are used for cover windows, then manufacturing cost is reduced, but manufacturing precision and defect rate worsen
Solution Approach 1:
The manufacturing process is divided into multiple sequential stages: laser irradiation to create modified regions, etching solution treatment to remove material, and rounding process to form final edges. Each stage performs a specific function that contributes to the overall precision, allowing complex precision requirements to be met through simpler individual steps.
Solution Approach 2:
The laser irradiation step performs preliminary modification of the substrate by creating regions with altered physical properties before the etching process. This preliminary action defines the precise locations where material removal should occur, ensuring high manufacturing precision before the actual etching begins.
2Reliability
If conventional manufacturing methods are used for cover windows, then manufacturing cost is reduced, but defect rate worsens
Solution Approach 1:
The controller coordinates the laser irradiation apparatus, etching apparatus, and rounding apparatus based on the desired cover window shape, creating a controlled feedback system. Each processing step is precisely regulated to match design specifications, reducing defects caused by dimensional inaccuracies or shape deviations.
Solution Approach 2:
The process utilizes changes in physical parameters of the substrate material through laser irradiation, creating regions with different etch rates. This parameter change allows precise control over where material is removed and how edges are formed, significantly reducing manufacturing defects.
3Manufacturing precision
If laser beam focal point position is controlled, then manufacturing precision improves, but device complexity increases
Solution Approach 1:
The controller serves multiple functions: it controls the laser irradiation apparatus, the etching apparatus, and the rounding apparatus, coordinating all processing steps. This multi-functionality reduces the need for separate control systems for each apparatus, managing complexity through integration while maintaining precise focal point control.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Reduces manufacturing costs and defect rates by enhancing the precision of the manufacturing process.
Implementation Method 1
A laser beam is irradiated on the substrate while adjusting a position of a focal point of the laser beam on the substrate according to a processing shape
Implementation Method 2
A laser beam is irradiated on the substrate while adjusting a position of a focal point of the laser beam on the substrate according to a processing shape
Implementation Method 3
The substrate irradiated by the laser beam is etched
Data Source
AI summary
A cover window manufacturing system comprises a laser irradiation apparatus including a stage configured to receive a substrate. A first laser module is disposed above the stage to provide a first laser beam to a top surface of the substrate. A controller controls a position of a focal point of the first laser beam on the substrate. An etching apparatus includes a chamber having an etching solution disposed therein. The etching apparatus is configured to receive the substrate processed by the laser irradiation apparatus and etch the substrate processed by the laser irradiation apparatus by immersion in the etching solution.