CRLH Waveguide Layout for Large-Area Uniform Microwave Plasma
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Solution Overview
Problem
Existing MPCVD reactors have limited deposition areas and are not energy efficient, limiting the ability to coat large substrates uniformly.
Innovation Solution
A Large Area MPCVD (LA MPCVD) reactor apparatus using a Composite Right/Left-Handed (CRLH) waveguide section to couple microwave energy into a large area deposition chamber, enabling uniform plasma generation over a larger area by employing a CRLH waveguide with slots to distribute electromagnetic energy uniformly across the chamber.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If a traditional waveguide is used to couple microwave energy into the reactor chamber, then the plasma is concentrated in a small volume above the substrate holder, but the deposition area is limited and energy efficiency is reduced
Solution Approach 1:
The waveguide is segmented into multiple sections with different impedance values along its length. This segmentation allows the microwave energy to be distributed progressively across different regions of the reactor chamber, enabling large area plasma generation while maintaining efficient energy coupling. The segmented structure transforms the concentrated plasma into a distributed plasma covering a large deposition area.
2Area of stationary object
If microwave energy is concentrated to form plasma in a small volume, then the plasma density is high, but the deposition area remains limited
Solution Approach 1:
The invention transitions from concentrating plasma in one dimension (small volume above substrate) to distributing plasma across two dimensions (large area covering the substrate surface). The tapered waveguide structure achieves this dimensional transition by progressively expanding the plasma generation region from a concentrated point to a distributed area, enabling large area deposition while maintaining adequate plasma density across the expanded region.
3Volume of moving object
If the reactor chamber is designed to concentrate microwave energy, then plasma formation is efficient, but the plasma region remains small in volume
Solution Approach 1:
The waveguide impedance parameter is changed progressively along its length, creating a gradient that transforms the plasma region from a small concentrated volume to a large distributed volume. This parameter change allows the microwave power to be distributed throughout the expanded plasma region, maintaining efficient power utilization while achieving the desired large plasma volume for large area deposition.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The LA MPCVD reactor allows for uniform film deposition over large areas, supports scaling to accommodate standard-sized wafers, and operates efficiently at higher pressures, overcoming the limitations of traditional reactors.
Implementation Method 1
employing a CRLH waveguide with slots to distribute electromagnetic energy uniformly across the chamber
Implementation Method 2
A Large Area MPCVD (LA MPCVD) reactor apparatus using a Composite Right/Left-Handed (CRLH) waveguide section to couple microwave energy into a large area deposition chamber
Implementation Method 3
the strong localized electric field of the microwave energy within the chamber ionizes working gases to form diamond material
Implementation Method 4
form a high temperature plasma that promotes a reaction that forms a vapor of material that becomes deposited on the nearby located substrate
Implementation Method 5
microwave plasma chemical vapor deposition MPCVD
Implementation Method 6
The reaction of constituents of the atmosphere then takes place within the relatively small plasma region at which the strong localized electric field of the microwave energy within the chamber ionizes working gases to form diamond material
Implementation Method 7
deposition of the diamond material takes place on a suitable substrate that is supported on the substrate holder
Implementation Method 8
The LA MPCVD reactor allows for uniform film deposition over large areas
Data Source
AI summary
A large area microwave plasma chemical vapour deposition, LA MPCVD reactor apparatus and method for large area microwave chemical vapour deposition, comprising a reactor chamber adapted to provide a plasma region in an interior of the reactor chamber by electromagnetic energy at a first frequency, and a CRLH waveguide section adapted to operate with an infinite wavelength at the first frequency and having in a wall a coupler means arranged to couple electromagnetic energy from an interior of the CRLH waveguide section to the interior of the reactor chamber.