Asymmetric Cross-Patch Reflectarray for Stable Reflection Phase
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Solution Overview
Problem
Existing reflectarrays face issues with dimensional errors in element patterns leading to significant variation in reflection phases and reduced reflection intensity, making it difficult to achieve high non-defective product rates.
Innovation Solution
A reflectarray design that includes a layer of element patterns, a dielectric layer, and a ground layer, with reflection control areas featuring unit cells having element patterns with different widths in the x and y axes, allowing for asymmetrical reflection control.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If element patterns with uniform dimensions are used in reflectarray, then manufacturing process is simple, but dimensional errors cause significant variation in reflection phases and reduced reflection intensity
Solution Approach 1:
The patent applies local quality by making element patterns asymmetric with different widths in x and y directions. This local differentiation allows each element to compensate for dimensional errors through its asymmetric geometry, stabilizing reflection phases across the reflectarray surface without requiring complex manufacturing processes.
Solution Approach 2:
The patent directly applies asymmetry by designing element patterns where the width in the x-direction differs from the width in the y-direction. This asymmetric configuration creates a geometric property that is insensitive to typical manufacturing dimensional errors, thereby maintaining stable reflection phases while keeping the manufacturing process relatively simple.
2Reliability
If cruciform reflecting elements are used to control electromagnetic wave direction, then wave direction control is achieved, but dimensional errors significantly affect reflection phases and reduce non-defective product rate
Solution Approach 1:
The patent applies parameter changes by modifying the geometric parameters of the element patterns to be asymmetric. By setting different widths in x and y directions, the system changes the sensitivity parameters of the reflectarray, making the reflection phase less sensitive to manufacturing dimensional errors and thereby improving the non-defective product rate.
3Manufacturing precision
If element patterns with different widths are used in reflection control area, then reflection phases are stabilized against dimensional errors, but element pattern design complexity increases
Solution Approach 1:
The patent makes different parts of the element pattern (x-direction width and y-direction width) have different properties. This local quality differentiation stabilizes reflection phases by compensating for dimensional errors through the asymmetric geometry, while the overall structure remains relatively simple to manufacture.
Solution Approach 2:
The patent employs asymmetry in the element pattern design where widths differ in orthogonal directions. This asymmetric configuration provides inherent tolerance to manufacturing variations, stabilizing reflection phases without requiring overly complex design or manufacturing processes.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Improves the non-defective product rate of reflectarrays by stabilizing reflection phases and enhancing reflection intensity, addressing the challenges of dimensional errors.
Implementation Method 1
multiple supercells having two or more types of cruciform metal resonators with different arm lengths. These supercells with metal resonators are formed on the top surface of the dielectric substrate and arrayed with a periodicity of a diffraction grating that reflects vertically and horizontally polarized incident waves and anomalously reflects electromagnetic waves of a predetermined frequency at the required phase.
Data Source
Figure 1
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Figure 3(a)~3(b)
AI summary
The present invention aims to provide a technique for improving a non-defective product rate. One of typical reflectarrays of the present invention is a reflectarray including at least a layer of element patterns, a dielectric layer, and a ground layer laminated in this order, wherein the reflectarray includes at least one reflection control areal; the reflection control area includes at least two unit cells; one element pattern is arranged on each unit cell; the element pattern includes a cross-patch in which two rectangular patches are orthogonal to each other in an xy plane; and in the reflection control area, a first element width wx which is a width of the element pattern in an x axis direction or/and a second element width wy which is a width of the element pattern in a y axis direction is/are different between the element patterns arranged in the respective at least two unit cells.