Crystalline Cathode Layer Deposition Without High-Temperature Annealing
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Solution Overview
Problem
The existing methods for forming crystalline layers in solid-state batteries, such as cathode layers, require high-energy annealing processes that consume significant energy and can damage underlying substrates.
Innovation Solution
A method is developed to form crystalline layers by generating plasma remotely from sputter targets and confining it between the targets and the substrate, allowing for the deposition of crystalline cathode layers without post-deposition annealing, using alkali or alkaline earth metals, transition metals, and counter-ions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If conventional plasma deposition with target-based plasma generation is used, then crystalline material can be deposited, but high-energy annealing is required which consumes significant energy and may damage underlying substrates
Solution Approach 1:
A remote plasma source is introduced as an intermediary between the sputter target and substrate. The plasma is generated remotely and transported to interact with the sputtered material, enabling crystalline deposition without direct target-based plasma generation. This mediator approach allows energy-efficient plasma utilization while avoiding the need for high-energy annealing that would damage substrates.
Solution Approach 2:
The plasma generation and deposition processes are segmented into separate stages: (1) remote plasma generation in a first region, (2) plasma transport through a defined path, and (3) plasma-sputtered material interaction near the substrate. This segmentation allows optimized plasma utilization and eliminates the need for high-temperature annealing, reducing energy consumption while protecting substrates.
2Manufacturing precision
If conventional plasma deposition is used, then crystalline layers can be formed, but the process requires high energy input that may damage flexible substrates
Solution Approach 1:
The remote plasma source acts as a mediator that delivers the necessary plasma energy to form high-quality crystalline layers without requiring high-energy annealing that would damage flexible substrates. The plasma is generated remotely and transported to interact gently with the deposited material, maintaining crystalline quality while protecting the substrate.
Solution Approach 2:
The plasma parameters (generation location, transport path, interaction region) are changed from conventional target-based generation to remote generation with controlled transport. This parameter change enables crystalline layer formation at lower energies, preventing substrate damage while maintaining manufacturing precision.
3Use of energy by moving object
If remote plasma generation is used, then energy efficiency is improved, but plasma confinement and utilization must be optimized
Solution Approach 1:
The defined transport path acts as an intermediary structure that guides plasma from the remote source to the deposition region. This controlled path enables efficient plasma utilization while the complexity of plasma confinement is managed through geometric design rather than complex active control systems.
Solution Approach 2:
Plasma parameters are optimized for remote generation and transport, including plasma density, temperature, and flow characteristics along the transport path. These parameter changes enable efficient energy utilization while the confinement complexity is reduced through optimized plasma conditions rather than complex mechanical systems.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method enables the deposition of high-energy crystalline cathode layers at lower temperatures, reducing energy consumption and substrate damage, while maintaining efficient plasma utilization and allowing for large-area deposition on flexible substrates.
Implementation Method 1
generating a plasma remote from one or more sputter targets for forming the cathode layer, confining the plasma in a space between the substrate and the one or more sputter targets
Implementation Method 2
generating sputtered material from the one or more targets using the plasma, and depositing the sputtered material on the substrate, thereby forming the crystalline cathode layer
Data Source
AI summary
A method of forming a crystalline cathode layer of a solid-state battery on a substrate, the method including generating a plasma remote from one or more sputter targets for forming the cathode layer, generating sputtered material from the target or targets using the plasma, and depositing the sputtered material on the substrate, thereby forming the crystalline cathode layer.