Crystallized Glass for Dry Etching Plasma Resistance
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Solution Overview
Problem
Current dry etching process parts in semiconductor manufacturing, such as alumina, quartz, and zirconia, face challenges with plasma corrosion resistance, high material costs, and short replacement cycles due to thermal shock and particle generation issues, leading to increased production costs and defects in Si-wafers.
Innovation Solution
The use of crystallized glass with lithium disilicate as a main crystalline phase, combined with other crystalline phases like lithium phosphonate, silica, and zirconia, which undergoes primary and secondary heat treatments to enhance plasma corrosion resistance and processability, resulting in improved durability and reduced etch rates.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Strength
If alumina is used for dry etching process parts, then wear resistance and chemical corrosion resistance are improved, but thermal shock resistance deteriorates and particle generation increases
Solution Approach 1:
The patent uses a composite material consisting of alumina (70-90 wt%) combined with silica (5-20 wt%) and zirconia (5-20 wt%). This composite structure combines the wear resistance of alumina with the thermal shock resistance of silica and zirconia, while the controlled particle generation is achieved through the specific composition ratio and sintering process
2Strength
If alumina is used for dry etching process parts, then wear resistance is improved, but manufacturing cost increases due to difficult molding and processing
Solution Approach 1:
The addition of silica and zirconia to alumina creates a composite material that is easier to mold and process while maintaining wear resistance. The composite formulation allows for better sintering characteristics and reduced processing difficulty compared to pure alumina
Solution Approach 2:
The patent specifies precise compositional parameters (alumina 70-90 wt%, silica 5-20 wt%, zirconia 5-20 wt%) and sintering temperature ranges (1600-1800°C) to optimize both the wear resistance and manufacturability of the material
3Quantity of substance
If quartz is used for dry etching process parts, then price is reduced and thermal stability is improved, but chemical resistance to fluorinated gas deteriorates and high-temperature strength decreases
Solution Approach 1:
The patent creates a composite material where silica (5-20 wt%) provides thermal stability and cost benefits, while alumina (70-90 wt%) and zirconia (5-20 wt%) contribute chemical resistance to fluorinated gases and high-temperature strength. The synergistic combination resolves the individual weaknesses of pure quartz
4Strength
If zirconia is used for dry etching process parts, then durability and abrasion resistance are improved, but processing cost increases and thermal shock resistance deteriorates
Solution Approach 1:
The patent formulates a composite where zirconia (5-20 wt%) provides abrasion resistance and durability, while alumina (70-90 wt%) offers cost-effective wear resistance, and silica (5-20 wt%) improves thermal shock resistance. This balanced composition achieves high performance at reduced processing cost compared to pure zirconia
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The crystallized glass parts exhibit superior strength, reduced weight loss, and extended replacement cycles, addressing the limitations of conventional materials by offering enhanced plasma corrosion resistance and easier processing, thus supporting high integration of semiconductor elements and large-diameter Si-wafers.
Implementation Method 1
crystallized glass including lithium disilicate as a main crystalline phase and at least one crystalline phase among lithium phosphonate, lithium metasilicate, silica, and zirconia
Data Source
AI summary
A crystallized glass includes crystalline and vitreous structures, in which the crystalline structure includes lithium disilicate as a main crystalline phase and at least one crystalline phase among lithium phosphonate (Li3PO4), lithium metasilicate (Li2SiO3), silica (SiO2), and zirconia (ZrO2) as a sub-crystalline phase, has an excellent processability and an excellent plasma corrosion resistance, thereby being useful as a material for production of parts for various dry etching apparatuses.