Crystallographic Analysis Subsystem for Fabrication Process Control

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Solution Overview

Problem

Current fabrication processes lack real-time monitoring and control capabilities for crystallographic properties, leading to inefficiencies and delays in identifying and addressing issues during the manufacturing of materials like semiconductors, where offline destructive testing is common and time-consuming.

Innovation Solution

A system integrating a crystallographic analysis subsystem with fabrication subsystems, utilizing neural networks for feed-forward and feedback control to adjust process parameters in real-time, enabling concurrent monitoring and control of fabrication processes.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If offline destructive sampling is used to examine crystallographic properties, then measurement precision can be achieved, but productivity is reduced due to time-consuming separate analysis

Engineering Contradiction:

Improvecrystallographic measurement precisionVSAvoidfabrication process productivity

Core Design Contradiction:

Measurement precisionVSProductivity

Solution Approach 1:

The patent combines the fabrication process and crystallographic analysis into a single integrated system. The analysis subsystem is coupled with fabrication subsystems to perform real-time monitoring during the fabrication process itself, eliminating the need for separate offline destructive sampling while maintaining measurement precision through non-destructive techniques

Inventive Principle:

Principle #5Merging (Combining)

Solution Approach 2:

The patent replaces destructive mechanical sampling with non-destructive analytical techniques. Instead of physically removing and destroying samples for examination, the system uses coupled analysis subsystems to perform real-time crystallographic measurements on the workpiece during fabrication, preserving the workpiece while obtaining precise measurements

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

2Measurement precision

If offline analysis techniques are used, then measurement precision is maintained, but loss of time increases due to delays between problem occurrence and detection

Engineering Contradiction:

Improvecrystallographic analysis precisionVSAvoidtime delay in problem detection

Core Design Contradiction:

Measurement precisionVSLoss of time

Solution Approach 1:

The patent implements a feedback control system where the analysis subsystem continuously monitors crystallographic properties during fabrication and provides real-time feedback to the fabrication subsystems. This allows immediate detection and correction of deviations from desired crystallographic parameters, eliminating time delays associated with offline batch analysis

Inventive Principle:

Principle #23Feedback

Solution Approach 2:

The patent enables continuous real-time monitoring and control throughout the fabrication process. The coupled subsystems operate concurrently, with the analysis subsystem continuously examining crystallographic properties and the fabrication subsystem continuously adjusting parameters based on feedback, eliminating the intermittent nature of offline sampling and analysis

Inventive Principle:

Principle #20Continuity of useful action

3Device complexity

If conventional offline sampling is used, then device complexity is reduced, but loss of information occurs as results are applied to subsequent batches rather than controlling ongoing processes

Engineering Contradiction:

Improvesystem complexityVSAvoidprocess control information loss

Core Design Contradiction:

Device complexityVSLoss of information

Solution Approach 1:

The patent establishes a closed-loop feedback system where crystallographic measurement results are immediately fed back to control the ongoing fabrication process. This real-time information flow ensures that process parameters are continuously adjusted based on actual crystallographic conditions, preventing information loss and enabling precise control of each fabrication batch rather than applying results retrospectively to subsequent batches

Inventive Principle:

Principle #23Feedback

Data Source

PatentUS7972440B2Monitoring and control of a fabrication process

Publication Date: 2011.07.05 BELL SEMICONDUCTOR LLC

AI summary

A system (10) for monitoring and controlling a fabrication process includes at least a first subsystem (12), a crystallographic analysis subsystem (14), and a second subsystem (16), wherein the first subsystem and second subsystem perform respective fabrication steps on a workpiece. The crystallographic analysis subsystem may be coupled to both the first subsystem and second subsystem. The analysis subsystem acquires crystallographic information from the workpiece after the workpiece undergoes a fabrication step by the first subsystem and then provides information, based on the crystallographic information acquired, for modifying parameters associated with the respective fabrication steps. The system may also include neural networks (24, 28) to adaptively modify, based on historical process data (32), parameters provided to the respective fabrication steps. The analysis subsystem may include a electromagnetic source (61), a detector (66), a processor (67), a controller (68) and a scanning actuator (65).