Cu2O Solar Cell p+ Interface Doping for Lower Carrier Recombination
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Solution Overview
Problem
Conventional Cu2O solar cells experience low efficiency due to significant recombination of carriers on the surface of the p-electrode, particularly when light is irradiated from the p-electrode side, leading to a decrease in short circuit current.
Innovation Solution
The implementation of a p+ type region with high concentrations of p-type dopants, such as Si and Ge, in the vicinity of the p-electrode interface, combined with a passivation layer, to suppress recombination and enhance photocarrier generation efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If light is irradiated from the p-electrode side in a light transmissive Cu2O solar cell, then the solar cell can utilize light from both sides, but short circuit current becomes small due to carrier recombination on the p-electrode surface
Solution Approach 1:
The patent applies local quality by creating a p+ type region with high dopant concentration specifically at the p-electrode interface (within 10-100 nm from the interface), while maintaining lower dopant concentration in the bulk p-type light-absorbing layer. This localized modification suppresses carrier recombination at the critical p-electrode surface where light enters from the p-side, thereby improving short circuit current while preserving the dual-sided light irradiation capability
Solution Approach 2:
The patent changes the dopant concentration parameter by introducing a p+ type region with high dopant concentration (10^19 to 10^21 atoms/cm³) at the p-electrode interface, compared to the lower dopant concentration in the bulk layer. This parameter change modifies the electrical properties at the surface to reduce recombination losses, enabling improved performance when light is irradiated from the p-electrode side
2Adaptability or versatility
If transparent electrodes are used for both n-electrode and p-electrode to enable light transmissivity, then light can be irradiated from both sides, but efficiency decreases due to carrier recombination on the p-electrode surface
Solution Approach 1:
The patent applies local quality by creating a p+ type region with high dopant concentration specifically at the p-electrode interface (within 10-100 nm from the interface), while maintaining lower dopant concentration in the bulk p-type light-absorbing layer. This localized modification suppresses carrier recombination at the critical p-electrode surface where light enters from the p-side, thereby improving short circuit current while preserving the dual-sided light irradiation capability
Solution Approach 2:
The patent changes the dopant concentration parameter by introducing a p+ type region with high dopant concentration (10^19 to 10^21 atoms/cm³) at the p-electrode interface, compared to the lower dopant concentration in the bulk layer. This parameter change modifies the electrical properties at the surface to reduce recombination losses, enabling improved performance when light is irradiated from the p-electrode side
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach significantly increases short circuit current and overall efficiency by preventing carrier recombination, especially when light is incident from the p-electrode side, and improves conversion efficiency by up to 1.7 times compared to configurations without the p+ type region.
Implementation Method 1
Cu2O is a wide-gap semiconductor having a bandgap of 2.1 eV. Cu2O, which includes copper and oxygen existing abundantly on the earth, is a safe and inexpensive material. Therefore, Cu2O is expected to realize a solar cell with high efficiency and low cost.
Implementation Method 2
A region from an interface between the p-type light-absorbing layer and the p-electrode to 10 nm to 100 nm from the interface in a direction of the n-type layer is a p+ type region including a p-type dopant
Implementation Method 3
combined with a passivation layer, to suppress recombination and enhance photocarrier generation efficiency
Data Source
AI summary
A solar cell of an embodiment includes a p-electrode, a p-type light-absorbing layer directly in contact with the p-electrode, an n-type layer, and an n-electrode. The n-type layer is disposed between the p-type light-absorbing layer and the n-electrode. A region from an interface between the p-type light-absorbing layer and the p-electrode to 10 nm to 100 nm from the interface in a direction of the n-type layer is a p+ type region including a p-type dopant.


