Cubane Metal Oxide Resist Composition for Low-Scum EUV Patterning

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Solution Overview

Problem

Resist compositions containing metal compounds face challenges in achieving high sensitivity, reducing roughness, and minimizing scum formation during EUV photolithography, as they exhibit low solubility in developing solutions.

Innovation Solution

A resist composition utilizing a cubane-structured metal oxide that changes solubility upon exposure, allowing for the formation of positive or negative-tone resist patterns by selectively dissolving exposed or unexposed portions, thereby enhancing sensitivity and reducing roughness and scum.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Use of energy by moving object

If a metal compound is used in the resist composition, then EUV light absorption is improved and sensitivity is increased, but solubility in the developing solution decreases and scum increases

Engineering Contradiction:

ImproveEUV light absorptionVSAvoidsolubility in developing solution

Core Design Contradiction:

Use of energy by moving objectVSReliability

Solution Approach 1:

The patent changes the molecular structure parameter of the metal compound by introducing a cubane-structured metal oxide core. This structural modification fundamentally alters the solubility characteristics while maintaining high EUV absorption, resolving the contradiction between light absorption and solubility

Inventive Principle:

Principle #35Parameter changes

Solution Approach 2:

The patent creates a composite structure where a metal oxide core (cubane structure) is combined with organic ligands. This composite approach allows the inorganic core to provide high EUV absorption while the organic components provide solubility in the developing solution, simultaneously satisfying both requirements

Inventive Principle:

Principle #40Composite materials

2Productivity

If a metal compound is used in the resist composition, then sensitivity is improved, but roughness increases

Engineering Contradiction:

ImprovesensitivityVSAvoidroughness

Core Design Contradiction:

ProductivityVSManufacturing precision

Solution Approach 1:

The patent modifies the molecular parameters by adopting a cubane-structured metal oxide with specific ligand attachments. This structural parameter change enables the material to achieve both high sensitivity and low roughness by controlling the exposure-induced solubility change mechanism

Inventive Principle:

Principle #35Parameter changes

Solution Approach 2:

The patent inverts the conventional approach by using a metal oxide that becomes more soluble after exposure rather than less soluble. This inversion of the solubility change direction allows for reduced roughness while maintaining high sensitivity, as the exposed regions cleanly dissolve without leaving residues

Inventive Principle:

Principle #13The other way round (Inversion)

3Productivity

If a metal compound is used in the resist composition, then sensitivity is increased, but scum increases

Engineering Contradiction:

ImprovesensitivityVSAvoidscum

Core Design Contradiction:

ProductivityVSObject-generated harmful factors

Solution Approach 1:

The patent changes the chemical parameters of the metal compound by using a cubane-structured metal oxide with specific ligand configurations. This parameter change ensures complete dissolution of exposed regions without forming scum, while maintaining high sensitivity

Inventive Principle:

Principle #35Parameter changes

Solution Approach 2:

The patent converts the potential harm of metal compound aggregation (which would cause scum) into a benefit by designing a cubane structure with ligands that prevent aggregation. The structure that could have caused problems is instead used to achieve clean dissolution and eliminate scum formation

Inventive Principle:

Principle #22Blessing in disguise (Convert harm into benefit)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The composition achieves increased sensitivity and reduces roughness and scum formation, enabling effective pattern formation in semiconductor manufacturing.

Implementation Method 1

the metal compound includes a cubane-structured metal oxide... EUV light absorption can be improved

Methodology Applied

Scientific EffectEUV light absorption: Absorption (EM radiation)

Implementation Method 2

the metal compound exhibits changed solubility in a developing solution upon exposure

Methodology Applied

Scientific EffectSolubility change: Solvation

Data Source

PatentUS12631962B2Resist composition and method for forming resist pattern

Publication Date: 2026.05.19 TOKYO OHKA KOGYO CO LTD

AI summary

A resist composition containing a metal compound, in which a structure of the metal compound is changed upon exposure, and the metal compound exhibits changed solubility in a developing solution, in which the metal compound includes a cubane-structured metal oxide.