Cu-Ga Sputtering Target Alloy Composition for Machinability
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Solution Overview
Problem
The production of Cu-Ga sputtering targets is hindered by their high hardness and poor ductility, making surface machining difficult, especially when sodium is added, leading to slow machining speeds and challenges in creating complex shapes.
Innovation Solution
Incorporating small amounts of Zn, Sn, Ag, and Mg into the Cu-Ga alloy to improve mechanical workability, with a Ga content range of 15.0 to 50.0 atomic% and additive elements between 0.1 to 10.0 atomic%, along with optimizing theoretical density and oxygen content to enhance machinability and reduce defects.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If high Ga content Cu-Ga alloy is used to achieve high electrical power generation efficiency, then the electrical efficiency is improved, but the hardness increases and ductility decreases making machining difficult
Solution Approach 1:
The invention changes the chemical composition parameters of the alloy by adding specific elements (Al, Ti, V, Cr, Mn, or Zn) in controlled amounts (0.01-5 atomic%). This parameter change modifies the material properties to reduce hardness and improve ductility while maintaining the high Ga content (20-50 atomic%) necessary for electrical efficiency, thus resolving the contradiction between efficiency and machinability
Solution Approach 2:
The invention creates a composite alloy system by combining Cu-Ga base alloy with small amounts of specific additive elements. This composite approach leverages the beneficial effects of the additive elements (improved ductility and machinability) while preserving the core functionality of the Cu-Ga alloy (high electrical efficiency), thereby resolving the technical contradiction
2Reliability
If Na is added to improve electrical power generation efficiency, then the efficiency is improved, but the hardness increases further worsening machinability
Solution Approach 1:
The invention adjusts the composition parameters by introducing specific additive elements that counterbalance the hardening effect of Na. By controlling the amounts of these additives (0.01-5 atomic%), the material achieves optimal balance between efficiency (maintained through Na addition) and machinability (improved through additive elements), resolving the contradiction
3Manufacturing precision
If grinding work is performed to machine the sputtering target, then the surface finish is achieved, but the machining speed becomes slow and complex shapes are difficult to create
Solution Approach 1:
The invention changes the material parameters by adding specific elements that improve ductility and reduce hardness. This makes the material more suitable for cutting operations, enabling faster machining speeds and the ability to create complex shapes while still achieving acceptable surface finish, thus resolving the contradiction between precision and productivity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The modified sputtering target exhibits improved cutting machinability, faster machining speeds, and the ability to produce complex shapes with reduced defects and improved surface flatness, while maintaining high electrical power generation efficiency.
Implementation Method 1
a sputtering target used in forming a film of a compound including Cu and Ga as major components
Data Source
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AI summary
A sputtering target, which has excellent mechanical workability; and makes it possible to deposit a film of a compound including Cu and Ga as major components, is provided. The sputtering target includes: with respect to an all of metal elements in the sputtering target, 15.0 to 50.0 atomic% of Ga; 0.1 to 10.0 total atomic% of one or more metal elements selected from Al, Zn, Sn, Ag, and Mg; and the Cu balance and inevitable impurities.