Cumene-Stabilized Cleaning Composition for Semiconductor Residues
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing cleaning solutions for semiconductor devices suffer from impurity generation due to micron-sized residues during prolonged storage, leading to defects and reduced production yield.
Innovation Solution
A cleaning composition comprising an alcohol solvent and a cumene compound, with specific content ranges, is used to inhibit oxidation and reduce aldehyde and ketone formation, maintaining stability and purity over time.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Duration of action of stationary object
If a cleaning solution is stored for a long period of time, then it can be used continuously for cleaning processes, but impurities are generated due to oxidation and side reactions, leading to reduced cleaning performance and potential defects
Solution Approach 1:
The patent extracts and removes the harmful oxidation process by adding cumene compound as an antioxidant that prevents oxidation of the alcohol solvent. This extraction of the oxidation pathway prevents impurity generation while maintaining storage duration, directly resolving the contradiction between long-term storage and cleaning performance reliability
Solution Approach 2:
The cumene compound acts as an intermediary substance that mediates between the alcohol solvent and oxygen, preventing the oxidation reaction. The antioxidant serves as a protective intermediary that sacrifices itself to prevent the formation of aldehyde and ketone impurities, thereby maintaining cleaning performance over extended storage periods
2Reliability
If the cleaning solution contains components that improve cleaning power, then cleaning performance is enhanced, but side reactions occur during storage generating impurities
Solution Approach 1:
The patent converts the harmful side reactions into a beneficial protective mechanism. The cumene compound is designed to undergo controlled oxidation itself rather than allowing the alcohol solvent to oxidize, transforming the harmful oxidation process into a beneficial protective action that prevents impurity formation while maintaining cleaning power
3Productivity
If micron-sized impurities are present in the cleaning solution, then the solution can still be used for cleaning, but the impurities remain on the semiconductor device surface causing defects
Solution Approach 1:
The patent applies preliminary action by adding the cumene antioxidant compound to the cleaning solution before storage, which proactively prevents the formation of impurities during storage. This preliminary protective measure ensures that no micron-sized impurities are generated in the first place, maintaining both productivity and manufacturing precision
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition effectively prevents impurity formation on semiconductor surfaces, enhancing stability and cleaning performance, thereby improving production yield and reducing defects.
Implementation Method 1
a cleaning composition comprising an alcohol solvent and a cumene compound... to inhibit oxidation and reduce aldehyde and ketone formation
Data Source
AI summary
A cleaning composition according to an embodiment includes an alcohol solvent and a cumene compound. The content of the cumene compound is greater than 0 and 1 ppb or less based on the total weight of the composition. The cleaning composition may exhibit improved time-dependent stability and improved cleaning performance of semiconductor substrate residues.