Substrate Processing Cup Cleaning via Inclined Flow Path
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional substrate processing apparatuses face issues with foreign matters, such as crystals, adhering to the upper surface of the peripheral wall portion of the cup due to infiltrated processing liquid, which is not effectively removed.
Innovation Solution
A substrate processing apparatus with a cleaning liquid supply unit that includes a cleaning liquid ejection port with an inclined flow path and a retention portion to weaken the hydraulic power, ensuring the cleaning liquid efficiently reaches and cleans the upper surface of the peripheral wall portion, and a controller to manage the flow rate and rotation of the holding unit for effective cleaning.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the cup structure is used to receive scattered processing liquid, then the processing liquid can be collected and discharged, but foreign matters such as crystals adhere to the upper surface of the peripheral wall portion due to infiltrated processing liquid
Solution Approach 1:
The invention extracts and removes the harmful infiltrated processing liquid from the upper surface of the peripheral wall portion using a wiper member. The wiper member is configured to contact and wipe the upper surface, taking out the adhered processing liquid and preventing foreign matter accumulation, thus resolving the contradiction between effective liquid collection and foreign matter adhesion
Solution Approach 2:
The wiper member acts as an intermediary between the infiltrated processing liquid and the cup structure. It mediates the removal of harmful liquid from the peripheral wall surface without interfering with the primary function of the cup to collect and discharge scattered processing liquid, thus maintaining reliability while eliminating foreign matter adhesion
2Ease of operation
If the liquid receiving portion is made movable to improve cleaning access, then cleaning effectiveness increases, but device complexity increases
Solution Approach 1:
The liquid receiving portion is designed to be movable relative to the peripheral wall portion, allowing it to be positioned for effective cleaning when needed. This dynamic configuration enables the system to switch between operational states (cleaning mode and processing mode) without requiring complete structural redesign, thus improving cleaning accessibility while controlling overall device complexity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus effectively removes foreign matters from the upper surface of the peripheral wall portion, preventing their accumulation and maintaining the processing environment's integrity.
Implementation Method 1
a cleaning liquid supply unit that supplies a cleaning liquid to the upper surface of the peripheral wall portion
Data Source
AI summary
Disclosed is a substrate processing apparatus including: a holding unit that holds a substrate; a processing liquid supply unit that supplies a processing liquid to the substrate; a cup that includes a bottom portion, a tubular peripheral wall portion erected on the bottom portion, a liquid receiving portion provided above the peripheral wall portion and configured to receive the processing liquid scattered from the substrate, and a groove portion formed in a circumferential direction on an upper surface of the peripheral wall portion, and surrounds the holding unit; and a cleaning liquid supply unit that supplies a cleaning liquid to the upper surface of the peripheral wall portion.