Curable Composition Filtration for Imprint Pattern Peeling

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Solution Overview

Problem

The existing methods for producing curable compositions for imprints face issues such as pattern peeling during mold removal and clogging due to particle formation in the composition, especially when stored for long periods, which affects the quality and applicability of the imprints.

Innovation Solution

Passing a curable composition comprising a polymerizable monomer and initiator through a filter with an effective area of 200 cm2 or more, multiple times, to remove foreign substances and impurities, thereby preventing pattern peeling and clogging, and ensuring proper application onto substrates.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Duration of action of stationary object

If the curable composition is stored for long periods, then the composition remains available for use, but particles form and clogging occurs

Engineering Contradiction:
Improvestorage periodVSAvoiddischarging reliability
Core Design Contradiction:
Duration of action of stationary objectVSReliability

Solution Approach 1:

The curable composition is filtered through a membrane filter with a specific pore size (0.01 μm to 0.1 μm) before storage to remove particles and impurities in advance. This preliminary filtration action prevents particle formation and clogging during long-term storage, ensuring reliable discharging when the composition is later used for inkjet recording.

Inventive Principle:
Principle #10Preliminary action

2Stability of the object's composition

If particles are present in the curable composition, then the composition can be stored, but pattern peeling occurs during mold removal

Engineering Contradiction:
Improvecomposition stabilityVSAvoidpattern adhesion
Core Design Contradiction:
Stability of the object's compositionVSManufacturing precision

Solution Approach 1:

The curable composition undergoes preliminary filtration through a membrane filter with pore size of 0.01 μm to 0.1 μm before being used for imprinting. This removes particles and impurities that would otherwise cause pattern peeling during mold removal, while maintaining the stability and curability of the composition.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The invention specifies precise parameter ranges for the membrane filter pore size (0.01 μm to 0.1 μm) and filtration conditions to optimize particle removal while preserving the composition's curability and pattern adhesion properties. This parameter control ensures high manufacturing precision.

Inventive Principle:
Principle #35Parameter changes

3Ease of operation

If the curable composition is not filtered, then the composition remains simple to handle, but clogging and discharging failures occur

Engineering Contradiction:
Improvehandling easeVSAvoiddischarging reliability
Core Design Contradiction:
Ease of operationVSReliability

Solution Approach 1:

The curable composition is pre-filtered through a membrane filter with pore size of 0.01 μm to 0.1 μm to remove particles and impurities before storage and use. This preliminary action ensures reliable discharging through inkjet nozzles without clogging, while maintaining ease of operation through simple filtration and storage procedures.

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This method enhances patternability and prevents discharging failures, leading to improved adhesion and durability of the imprinted patterns, allowing for the formation of high-quality micropatterns with increased reliability and reduced defects.

Implementation Method 1

Passing a curable composition comprising a polymerizable monomer and initiator through a filter with an effective area of 200 cm2 or more, multiple times, to remove foreign substances and impurities

Methodology Applied
Scientific EffectFiltration: Filter (physical)

Implementation Method 2

a curable composition for patterning through photo-irradiation

Methodology Applied
Scientific EffectPhotopolymerization: Photopolymerisation

Data Source

PatentUS8820541B2Method for producing curable composition for imprints
Publication Date: 2014.09.02 FUJIFILM CORP
  • US8820541B2 patent drawing
  • US8820541B2 patent drawing
  • US8820541B2 patent drawing

AI summary

A method for producing a curable composition for imprints includes the step of passing a curable composition containing a polymerizable monomer (A) and a polymerization initiator (B) through a filter having an effective filter area of 200 cm2 or more at least one time. The method suppresses pattern-peeling when peeling the mold employed in forming a pattern using the curable composition for imprints, and thus provides excellent patternability.