Curable Composition for Imprints Reducing Line Edge Roughness
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Solution Overview
Problem
Conventional curable compositions for imprints suffer from degradation in patternability and line edge roughness, especially when used in repetitive pattern transfer processes, particularly when applied using an inkjet device.
Innovation Solution
A curable composition comprising a polymerizable compound, a photo-polymerization initiator, and a non-polymerizable compound with a polyalkylene glycol structure having terminal hydroxy groups, but lacking fluorine and silicon atoms, is used to enhance patternability and reduce line edge roughness.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If conventional curable compositions are used in repetitive pattern transfer processes, then productivity is improved through repeated use, but patternability degrades and line edge roughness increases
Solution Approach 1:
The patent changes the chemical composition parameters of the curable composition by incorporating specific compounds (carboxylic acid compounds with pKa 0-5, sulfur compounds, and phosphorus compounds) to maintain patternability across repetitive processing cycles. This compositional parameter adjustment allows the material to resist degradation during repeated imprinting operations.
Solution Approach 2:
The patent creates a composite curable composition by combining multiple functional components: polymerizable compounds, carboxylic acid compounds, sulfur compounds, phosphorus compounds, and catalysts. This composite formulation synergistically improves both productivity and patternability, preventing the degradation that occurs with conventional single-component systems.
2Ease of manufacture
If conventional curable compositions are used for imprinting, then ease of manufacture is maintained with simple formulations, but line edge roughness increases after etching
Solution Approach 1:
The patent modifies the chemical parameters of the curable composition by adding specific additives (carboxylic acid compounds, sulfur compounds, phosphorus compounds) that control etching behavior. These parameter changes reduce line edge roughness while maintaining formulation practicality for manufacturing.
Solution Approach 2:
The patent introduces intermediary compounds (carboxylic acid compounds, sulfur compounds, phosphorus compounds) that mediate between the polymerizable compound and the etching process. These intermediaries modify the material properties to achieve smoother line edges during etching without complicating the overall manufacturing process.
3Device complexity
If inkjet application method is used for curable composition, then device complexity is reduced compared to other application methods, but patternability degrades due to poor control
Solution Approach 1:
The patent adjusts the rheological and chemical parameters of the curable composition to be compatible with inkjet application. By modifying viscosity, reactivity, and composition, the material can be precisely deposited via inkjet printing while maintaining excellent patternability that would otherwise require more complex application equipment.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition maintains good patternability and minimizes line edge roughness after etching, even in repetitive pattern transfer processes, improving the overall performance of the curable composition for imprinting applications.
Implementation Method 1
a photo-polymerization initiator (B)
Data Source
AI summary
Disclosed is a to provide a curable composition for imprints capable of keeping a good patternability and of producing less defects even after repetitive pattern transfer. The curable composition for imprints comprising: a polymerizable compound (A);a photo-polymerization initiator (B); and a non-polymerizable compound (C) having a polyalkylene glycol structure having at least one terminal hydroxy group, or at least one etherified terminal hydroxy group, and containing substantially no fluorine atom and no silicon atom.