Curable Composition Inhibitor Control for Imprint Stability
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Solution Overview
Problem
Existing curable compositions used for forming interlayers in imprinting methods face challenges in achieving stable solutions and suppressing pattern defects in the curable layers formed on these interlayers.
Innovation Solution
A curable composition comprising a curable main agent with a polymerizable functional group, a polymerization inhibitor, and a solvent, where the polymerization inhibitor is present in a specific range (1 part by mass or greater and lower than 1,000 parts by mass with respect to 1,000,000 parts by mass of the curable main agent) to enhance solution stability and reduce pattern defects.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a curable composition is used to form an interlayer in imprinting methods, then the interlayer provides adhesion between substrate and curable layer, but the composition exhibits poor solution stability and causes pattern defects
Solution Approach 1:
The patent applies parameter changes by optimizing the polymerization inhibitor content to a specific range (0.01-10 parts by weight per 100 parts by weight of curable main agent) and selecting inhibitors with specific molecular weights (1,000 or less). This quantitative adjustment of chemical parameters resolves the contradiction by achieving both solution stability and pattern quality simultaneously.
Solution Approach 2:
The patent creates a composite curable composition system combining curable main agents (epoxy, polyester, vinyl, or phenolic resins) with specifically selected polymerization inhibitors. This composite approach allows the composition to exhibit both stability during storage and freedom from pattern defects during curing, resolving the technical contradiction through material composition optimization.
2Reliability
If high polymerization inhibitor content is used to improve solution stability, then stability increases but pattern defects increase
Solution Approach 1:
The patent resolves this contradiction by precisely controlling the polymerization inhibitor content within the range of 0.01-10 parts by weight per 100 parts by weight of curable main agent, with molecular weight of 1,000 or less. This optimized parameter range achieves sufficient solution stability while preventing pattern defects, avoiding both insufficient and excessive inhibitor content.
3Manufacturing precision
If low polymerization inhibitor content is used to reduce pattern defects, then pattern quality improves but solution stability decreases
Solution Approach 1:
The patent resolves this contradiction by setting the polymerization inhibitor content to a minimum effective level of 0.01 parts by weight per 100 parts by weight of curable main agent, combined with using inhibitors of molecular weight 1,000 or less. This optimized parameter combination maintains solution stability while minimizing pattern defects.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The proposed curable composition exhibits excellent solution stability and effectively suppresses pattern defects in the curable layers formed on the interlayer, improving the overall precision and accuracy of the imprinting process.
Implementation Method 1
a polymerization inhibitor; in which a content of the polymerization inhibitor is 1 part by mass or greater and lower than 1,000 parts by mass with respect to 1,000,000 parts by mass of the curable main agent
Implementation Method 2
a curable main agent having a polymerizable functional group
Data Source
AI summary
Provided are a curable composition used for forming an interlayer existing between a base material and a curable layer, the curable composition including a curable main agent having a polymerizable functional group, a polymerization inhibitor, and a solvent, in which a content of the polymerization inhibitor is 1 part by mass or greater and lower than 1,000 parts by mass with respect to 1,000,000 parts by mass of the curable main agent; a kit including the curable composition; an interlayer formed from the curable composition; a laminate including the interlayer; an imprint pattern producing method using the laminate; and a method for manufacturing a device including the imprint pattern producing method.