Curable Composition for Imprints with Aromatic Monomers
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Solution Overview
Problem
Current curable compositions for imprints lack both high patternability and dry etching resistance, making them inadequate for advanced micropatterning applications such as semiconductor integrated circuits and next-generation hard disc drives.
Innovation Solution
A curable composition comprising a polymerizable monomer represented by specific formulas, including (meth)acrylates with aromatic groups, a photopolymerization initiator, and optional additives like surfactants and antioxidants, which provides excellent patternability and dry etching resistance.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional curable compositions are used for imprinting, then the patterning process can be completed, but the resulting patterns exhibit poor dry etching resistance and insufficient pattern accuracy
Solution Approach 1:
The patent employs a composite curable composition containing multiple polymerizable monomers with different functions: a first monomer (formula 1) providing etching resistance through aromatic groups, a second monomer (formula 2) enhancing pattern accuracy through controlled viscosity and reactivity, and optionally a third monomer for additional property tuning. This multi-component system achieves both high dry etching resistance and superior pattern accuracy that single monomers cannot provide.
Solution Approach 2:
The patent optimizes specific parameters of the polymerizable monomers including molecular weight, viscosity (500 mPa·s or less for liquid monomers at 25°C), and functional group composition. By controlling these parameters, particularly the viscosity and aromatic content, the composition achieves optimal balance between pattern fidelity during imprinting and resistance to subsequent dry etching processes.
2Reliability
If high molecular weight monomers are used to improve dry etching resistance, then etching resistance increases, but viscosity increases and patternability deteriorates
Solution Approach 1:
The patent carefully controls the molecular weight and viscosity parameters of the polymerizable monomers. The first monomer has an aromatic group with molecular weight of 100 or more for etching resistance, while the second monomer is designed with viscosity of 500 mPa·s or less (when liquid at 25°C) to maintain good patternability. This parameter optimization allows high etching resistance without sacrificing pattern formation quality.
Solution Approach 2:
The patent creates a composite system where a high molecular weight first monomer (providing etching resistance) is combined with a low viscosity second monomer (providing patternability). The synergistic interaction between these components allows the system to achieve both high dry etching resistance and excellent pattern formation, overcoming the trade-off that would exist with single monomers.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves high pattern accuracy and resistance to dry etching, enabling cost-effective micropatterning suitable for semiconductor integrated circuits and other advanced applications.
Implementation Method 1
a curable composition for imprints comprising a polymerizable monomer (Ax) and a photopolymerization initiator
Data Source
AI summary
Provided is a curable composition for imprints having good patternability and dry etching resistance. Disclosed is a curable composition for imprints comprising a polymerizable monomer (Ax) having a substituent having an aromatic group and having a molecular weight of 100 or more, and a photopolymerization initiator.