Curable Imprint Coating for Faster Pattern Filling and Uniform Films
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Solution Overview
Problem
The existing photo-nanoimprint technology faces challenges with long filling times and non-uniform film physical properties due to insufficient mixing of curable compositions, leading to reduced throughput and defects in dry etching resistance.
Innovation Solution
A method involving the use of curable compositions (α1) and (α2) with accelerated mixing through exothermic reaction, forming a liquid film on the substrate, and dispensing droplets to achieve uniform mixing and curing, thereby enhancing throughput and film properties.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If curable compositions are dispensed dropwise and spread on substrate, then pattern formation is achieved, but filling time becomes long and throughput decreases
Solution Approach 1:
A surfactant is introduced as an intermediary substance between the curable composition and the substrate. The surfactant modifies the surface properties to enhance the spreading behavior of the curable composition, enabling faster filling of the pattern areas without compromising pattern formation quality. This mediator facilitates rapid uniform distribution of the curable composition across the substrate surface.
Solution Approach 2:
The invention changes the surface tension parameters by adding a surfactant to the curable composition. This parameter modification alters the wetting and spreading characteristics of the composition, allowing it to rapidly cover the substrate surface and fill pattern areas quickly, thereby reducing filling time while maintaining precise pattern formation.
2Loss of time
If curable compositions are mixed insufficiently, then processing time is reduced, but film physical properties become non-uniform and dry etching resistance deteriorates
Solution Approach 1:
The surfactant acts as a mixing promoter that facilitates rapid and uniform distribution of curable composition components. By reducing surface tension and enhancing wetting, the surfactant enables the composition to spread and mix uniformly across the substrate in a short time, achieving homogeneous film properties without requiring extended processing time for mixing.
Solution Approach 2:
The invention ensures continuous and uniform spreading action of the curable composition across the substrate surface. The surfactant maintains constant spreading pressure and promotes continuous flow of the composition into all pattern areas, ensuring uninterrupted mixing and uniform distribution throughout the film formation process, which results in consistent physical properties including dry etching resistance.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method achieves high throughput and uniform film properties with improved dry etching resistance by ensuring rapid and complete mixing of curable compositions, reducing defects and increasing productivity.
Implementation Method 1
the mixing of a composition (α1′) of components of the curable composition (α1) except a component (D1) serving as a solvent and a curable composition (α2) to be dispensed onto a liquid film of the composition (α1′) is exothermic
Data Source
AI summary
The method for fabricating pattern of a cured product includes a first step (arranging step) of arranging a layer formed of a liquid film of a curable composition (α1) containing at least a component (A1) serving as a polymerizable compound on a substrate and a second step (dispensing step) of dispensing liquid droplets of a curable composition (a2) containing at least a component (A2) serving as a polymerizable compound discretely onto a layer formed of a composition (α1′) of components of the curable composition (α1) except a component (D1) serving as a solvent, in which: the mixing of the composition (α1′) and the curable composition (α2) is exothermic.