Curable Composition for Imprints with Fluorine and Silicon Atoms
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Solution Overview
Problem
Current curable compositions for imprints face challenges in maintaining patternability and solvent resistance, particularly in repeated pattern transferring, where the pattern thickness changes when exposed to solvents.
Innovation Solution
A curable composition comprising a polymerizable compound with a fluorine atom and a silicon atom, along with an aromatic group, is developed, which includes specific structures and percentages to enhance patternability and solvent resistance, such as using polymerizable compounds with trifluoromethyl groups and acrylate or methacrylate groups, and a photopolymerization initiator for improved curing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional curable compositions are used for repeated pattern transferring, then initial patternability is achieved, but pattern thickness changes when exposed to solvents
Solution Approach 1:
The patent changes the chemical composition parameters of the curable composition by incorporating fluorinated compounds (such as fluorinated acrylic monomers and fluorinated oligomers) which provide enhanced solvent resistance. This chemical parameter change ensures that the cured pattern maintains its thickness and dimensional stability when exposed to solvents, while still achieving good patternability through controlled photopolymerization
Solution Approach 2:
The patent uses composite material formulation by combining multiple components: fluorinated acrylic monomers, fluorinated oligomers, photopolymerization initiators, and inert fillers. This composite approach creates a cured pattern with both good patternability (from the monomer/initiator system) and excellent solvent resistance (from the fluorinated components), resolving the contradiction between initial patterning quality and subsequent dimensional stability
2Productivity
If conventional curable compositions are used for repeated pattern transferring, then initial curing is achieved, but patternability deteriorates in repeated transfers
Solution Approach 1:
The patent ensures continuous patternability across repeated transfers by formulating a curable composition that maintains consistent rheological properties and curing characteristics. The fluorinated oligomers provide appropriate viscosity and mold-filling capability that persists through multiple imprint cycles, while the photopolymerization initiator system ensures complete and consistent curing each time, preventing deterioration of pattern quality
Solution Approach 2:
The patent adjusts key formulation parameters including the ratio of monomer to oligomer, the type and concentration of photopolymerization initiator, and the molecular weight distribution of fluorinated components. These parameter optimizations ensure that the composition remains processable and patterns consistently well during repeated imprint cycles, maintaining manufacturing precision across multiple transfers
3Reliability
If fluorinated compounds are added to improve solvent resistance, then solvent resistance improves, but viscosity increases
Solution Approach 1:
The patent segments the fluorinated components into different molecular weight classes: low molecular weight fluorinated acrylic monomers (providing low viscosity and good reactivity) and higher molecular weight fluorinated oligomers (providing solvent resistance). By segmenting the fluorinated content across different molecular weight ranges, the formulation achieves both low overall viscosity for good patternability and sufficient fluorinated content for excellent solvent resistance
Solution Approach 2:
The patent applies local quality by having different components serve different functions: the fluorinated acrylic monomers primarily provide low viscosity and participate actively in polymerization, while the fluorinated oligomers primarily provide solvent resistance and dimensional stability. This functional differentiation allows the system to achieve both low viscosity and high solvent resistance without compromise
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves good patternability and solvent resistance, ensuring the integrity of the pattern even after repeated transfers and exposure to solvents, enhancing the reliability and durability of the imprinted structures.
Implementation Method 1
a curable composition for imprints, comprising (A) a polymerizable compound and (B) a photopolymerization initiator
Data Source
AI summary
A curable composition for imprints, containing (A1) a polymerizable compound having at least one of a fluorine atom and a silicon atom, (A2) a polymerizable compound having an aromatic group and (B) a photopolymerization initiator, exhibits good patternability in repeated pattern transferring and solvent resistance.