Curable Imprint Composition Moisture Control Pattern Chipping

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Solution Overview

Problem

Curable compositions for imprints face issues with pattern chipping due to moisture content, which affects the radical polymerization reaction and leads to defects in the cured pattern.

Innovation Solution

A curable composition with a moisture content ratio of less than 0.8% by weight, containing a curable compound and a photo-polymerization initiator, and optionally a polar group-containing non-polymerizable compound, is used, and the composition is prepared and stored under controlled humidity and temperature conditions to minimize moisture absorption.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If the curable composition contains moisture, then the composition is easier to prepare and store, but the cured pattern exhibits chipping defects

Engineering Contradiction:

Improveease of preparation and storageVSAvoidpattern formability

Core Design Contradiction:

Ease of manufactureVSManufacturing precision

Solution Approach 1:

The patent applies parameter changes by strictly controlling the moisture content parameter of the curable composition to 0.01% or less. This parameter control prevents water from interfering with the radical polymerization reaction, thereby eliminating pattern chipping while maintaining the composition's ease of preparation and storage

Inventive Principle:

Principle #35Parameter changes

Solution Approach 2:

The patent creates an inert environment by excluding water from the curable composition system. By maintaining extremely low moisture content, the composition prevents water-related side reactions during polymerization, ensuring high pattern formability without compromising manufacturing ease

Inventive Principle:

Principle #39Inert atmosphere (Inert environment)

2Manufacturing precision

If the moisture content is reduced to less than 0.8% by weight, then chipping of the cured pattern is suppressed, but the composition requires controlled humidity storage conditions

Engineering Contradiction:

Improvepattern formabilityVSAvoidstorage condition control

Core Design Contradiction:

Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent applies preliminary action by pre-controlling the moisture content of the curable composition to extremely low levels (0.01% or less) before use. This preliminary moisture removal eliminates the need for complex storage controls, as the composition remains stable under normal storage conditions while maintaining high pattern formability

Inventive Principle:

Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The controlled moisture content effectively suppresses chipping of the cured pattern, improving pattern formability and reducing defects in the final product.

Implementation Method 1

a curable composition for imprints and a method of storing the same... containing a curable compound and a photo-polymerization initiator... curable by a radical polymerization reaction

Methodology Applied

Scientific EffectPhotopolymerization: Photopolymerisation

Data Source

PatentUS9663671B2Curable composition for imprints and method of storing the same

Publication Date: 2017.05.30 FUJIFILM CORP

AI summary

Provide is a curable composition for imprints, capable of effectively suppressing chipping of the cured pattern. A curable composition for imprints comprising (A) curable compound and (B) photo-polymerization initiator, having a moisture content ratio, relative to the total weight of all components excluding solvent, of less than 0.8% by weight.