Curable Composition for Imprinting Adhesiveness and Stability
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Solution Overview
Problem
Existing curable compositions for imprinting often suffer from insufficient adhesiveness with substrates and poor storage stability, which hinders the formation of high-quality patterns and masks in nanoimprint lithography.
Innovation Solution
A curable composition comprising a compound represented by Formula (1), a radically polymerizable compound, and a photoradical polymerization initiator, with specific molecular weight and viscosity ranges, and a content of the compound between 0.005 to 1 part by mass per 100 parts by mass of the radically polymerizable compound, enhancing adhesiveness and storage stability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional curable compositions are used for imprinting, then the composition can be applied to substrates, but the adhesiveness with substrates is insufficient and storage stability is poor
Solution Approach 1:
The patent uses a composite curable composition containing multiple components: a cyclic carbonate monomer (provides adhesiveness), a vinyl monomer (improves storage stability), and a photopolymerization initiator. This composite formulation resolves the contradiction by combining materials with complementary properties, where the cyclic carbonate provides strong substrate adhesion while the vinyl monomer enhances storage stability without sacrificing adhesiveness.
Solution Approach 2:
The patent optimizes the molecular weight and structural parameters of the cyclic carbonate monomer (specifically requiring 1,3-dioxolan-2-one or 1,3-dioxepan-2-one structures with controlled molecular weight ranges) to achieve the balance between adhesiveness and storage stability. By precisely controlling these chemical parameters, the composition achieves both high substrate adhesion and improved storage stability.
2Reliability
If high etching resistance is achieved using conventional compositions, then mask quality improves, but adhesiveness with substrate deteriorates
Solution Approach 1:
The composite curable composition combines cyclic carbonate monomers (which provide strong etching resistance when cured) with vinyl monomers and specific photopolymerization initiators. This composite approach allows the cured mask to exhibit high etching resistance while the uncured composition maintains excellent substrate adhesion, resolving the contradiction between mask quality and substrate bonding.
3Manufacturing precision
If the curable composition is pressed against the substrate with a mold, then pattern transfer is achieved, but high pressure is required and thermal shrinkage occurs
Solution Approach 1:
The patent replaces the thermal imprinting mechanism (which requires high pressure and heat) with a photoimprinting mechanism. The curable composition is cured by photopolymerization upon light irradiation while the mold is pressed against it, eliminating the need for high-temperature heating and high-pressure mechanical forcing. This substitution achieves accurate pattern transfer with reduced mechanical stress and no thermal shrinkage.
4Reliability
If the molecular weight of the cyclic carbonate monomer is increased to improve etching resistance, then mask quality improves, but filling properties and mold releasability deteriorate
Solution Approach 1:
The patent precisely controls the molecular weight parameters of the cyclic carbonate monomer within specific ranges (1,3-dioxolan-2-one or 1,3-dioxepan-2-one structures with controlled molecular weights). This parameter optimization ensures that the cured mask achieves high etching resistance while the uncured composition maintains low viscosity for rapid mold filling and easy mold release, resolving the contradiction between mask quality and productivity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves excellent adhesiveness with substrates and improved storage stability, enabling the formation of high-quality patterns and masks with enhanced mold releasability and etching resistance, suitable for nanoimprint lithography.
Implementation Method 1
a photoradical polymerization initiator... the curable composition is cured by light irradiation
Data Source
AI summary
The curable composition for imprinting includes: a compound represented by the following Formula (1); a radically polymerizable compound other than the compound represented by Formula (1); and a photoradical polymerization initiator, in Formula (1), R1 and R2 each independently represent a hydrogen atom or an organic group having 1 to 8 carbon atoms and may be bonded to each other to form a ring, R3 represents a monovalent organic group, and R4 and R5 each independently represent a hydrogen atom or a monovalent organic group.