Curing System with Graph-Based Bake Cycle Control
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Solution Overview
Problem
Existing curing systems, such as those using ultraviolet (UV) curing or oven curing with hot air convection or long wavelength infrared heating, face challenges in achieving precise control over the curing process, particularly in terms of temperature profiles, which can affect the quality of the cured surface.
Innovation Solution
A curing system that includes a display, a radiation emitter lamp, and a control system with a processor. The processor allows users to customize a bake cycle by adjusting points on a graph representing time versus temperature, enabling the emission of radiation according to the customized cycle.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If hot air convection or long wavelength infrared heating systems are used to apply energy to the surface molecules of a coating, then the curing process can be performed, but precise control over the curing process and temperature profiles is difficult to achieve
Solution Approach 1:
The patent implements feedback control by using sensors to monitor the actual temperature profile during the curing process and comparing it to the desired profile. The control system then adjusts the heating elements in real-time to correct any deviations, enabling precise control over the curing process while maintaining manageable system complexity through automated closed-loop control.
Solution Approach 2:
The patent employs dynamic control of heating elements by allowing real-time adjustment of power delivery to different zones during the curing cycle. The system can dynamically modify temperature profiles based on process requirements, enabling precise control over curing parameters while adapting to different coating types and substrate requirements.
2Adaptability or versatility
If a fixed bake cycle profile is used for curing, then the curing process can be performed, but the system cannot be adapted to different types of paint, object sizes, or specific curing requirements
Solution Approach 1:
The patent implements dynamic and adjustable bake cycle profiles that can be customized for different applications. The control system allows modification of temperature-time parameters, heating zones, and cycle durations to accommodate various paint types, object sizes, and curing requirements, providing high adaptability while maintaining user-friendly operation through programmable interfaces.
Solution Approach 2:
The patent enables customization of curing parameters including temperature profiles, heating rates, and cycle durations. By allowing users to adjust these parameters based on specific requirements for different paints and objects, the system achieves high versatility without requiring complex hardware modifications, relying instead on flexible software-based parameter control.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution allows for improved curing control by enabling users to customize temperature profiles based on specific surface coatings, object sizes, and other factors, resulting in enhanced curing quality and efficiency.
Implementation Method 1
a first radiation emitter lamp... emitting radiation via the first radiation emitter lamp
Implementation Method 2
The energy is transferred inward by conduction principles to cure, for example, paint
Data Source
AI summary
A curing system is included. The curing system includes a display, a first radiation emitter lamp, and a control system. The control system is operatively coupled the first radiation emitter lamp. The control system includes a processor configured to present, on the display, a first bake cycle, the bake cycle comprising a curve having at least two points. The processor is further configured to receive user input to adjust the at least two points by moving the points within a graph. The processor is additionally configured to emit radiation via the first radiation emitter lamp by following the bake cycle.