Curved Mirror VUV Charge Control for Large Substrates
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Solution Overview
Problem
Existing technologies face challenges in effectively controlling electrostatic charges on large area substrates in vacuum environments, particularly in vacuum ultraviolet (VUV) spectral radiant flux systems, which can lead to electrostatic discharge (ESD) damage and imaging deterioration during the manufacturing of electronic and optoelectronic devices.
Innovation Solution
A charge control apparatus is introduced, featuring a light source emitting a beam of radiation with a curved mirror that reduces divergence and allows for directional control of the reflected beam, enabling efficient electrostatic charge removal on large substrates within a vacuum chamber.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional ionizers are used for charge neutralization, then electrostatic charges can be eliminated, but they cannot be used in vacuum environments and are ineffective for large area substrates
Solution Approach 1:
The patent changes the fundamental parameter of the neutralization mechanism from charged particle-based (conventional ionizers) to photon-based (VUV radiation). This parameter change enables the system to operate in vacuum environments while maintaining charge control effectiveness, as photons do not require gaseous environments for propagation and can directly ionize residual molecules to neutralize charges on large area substrates
Solution Approach 2:
The patent replaces the mechanical/electrical system of conventional ionizers with an optical system using VUV radiation. This substitution eliminates the need for gaseous environments and enables effective charge neutralization in vacuum conditions, while the curved mirror system enhances the spatial coverage for large area substrates
2Area of stationary object
If multiple radiation sources are used to cover large substrates, then complete coverage is achieved, but system complexity and cost increase
Solution Approach 1:
The patent employs a curved mirror with a specific radius of curvature to focus and distribute VUV radiation from a single point source across a large area substrate. The curved geometry enables a single radiation source to effectively cover large substrate areas by controlling the radiation pattern, eliminating the need for multiple sources while maintaining complete coverage
Solution Approach 2:
The patent integrates the curved mirror and rotation mechanism within a compact apparatus structure, nesting multiple functional elements (light source, curved mirror, rotation assembly) in a hierarchical arrangement. This nesting enables the system to achieve large area coverage through coordinated motion and geometry rather than requiring proportionally large numbers of radiation sources
3Area of stationary object
If a fixed radiation beam is used, then the system is simple, but it cannot effectively treat large area substrates requiring multiple positions
Solution Approach 1:
The patent introduces dynamic control through a rotation mechanism that enables the curved mirror to vary the direction of the reflected VUV beam. This dynamic adjustment allows a single radiation source to effectively treat multiple positions on large area substrates by changing the beam direction, achieving comprehensive coverage without requiring multiple fixed sources or complex multi-axis positioning systems
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution effectively reduces the risk of electrostatic discharge and improves imaging quality by uniformly irradiating large substrates with VUV radiation, enhancing the manufacturing process for electronic and optoelectronic devices while minimizing the need for multiple radiation sources.
Implementation Method 1
a mirror configured to reflect the beam of radiation, wherein a curvature of a mirror surface of the curved mirror is configured to reduce the divergence of the beam of radiation
Implementation Method 2
Vacuum Ultraviolet radiation (VUV) aims to eliminate electrostatic charges by directly ionizing residual molecules in a depressurized environment
Data Source
AI summary
A charge control apparatus for controlling charge on a substrate in a vacuum chamber is described. The apparatus includes a light source emitting a beam of radiation having a divergence; a mirror configured to reflect the beam of radiation, wherein a curvature of a mirror surface of the curved mirror is configured to reduce the divergence of the beam of radiation; and a mirror support configured to rotatably support the curved mirror, wherein a rotation of the mirror varies the direction of the beam of radiation.