Curved Polygon Layout Decomposition for Double Patterning
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Solution Overview
Problem
The photolithography process in semiconductor manufacturing faces challenges in forming patterns due to limitations, necessitating the development of effective methods for the double patterning technology (DPT) to enhance the reliability and precision of semiconductor devices.
Innovation Solution
A method involving a computing system that decomposes a design layout by converting polygon types to curved polygon types, generating stitching shapes to prevent acute corners, separating designs by color, and performing optical proximity correction (OPC) to ensure design rule satisfaction and accurate pattern formation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If double patterning technology is used to form finer patterns, then pattern fineness is improved, but process complexity increases
Solution Approach 1:
The patent divides the pattern decomposition process into multiple sequential steps: generating initial decomposed layouts, identifying stitching areas, generating stitching shapes, and performing acute corner checks. This segmentation of the complex DPT process into manageable stages reduces overall process complexity while maintaining pattern fineness.
Solution Approach 2:
The patent performs preliminary actions by generating stitching shapes in advance to prevent acute corners before final pattern formation. By proactively addressing potential acute corner issues during the decomposition stage rather than after manufacturing, the process complexity is reduced while ensuring high manufacturing precision.
2Manufacturing precision
If stitching shapes are generated to prevent acute corners, then manufacturing precision is improved, but device complexity increases
Solution Approach 1:
The patent applies local quality by generating stitching shapes specifically in stitching areas where acute corners may occur, rather than modifying the entire layout. This localized approach adds minimal complexity only where needed while maintaining high manufacturing precision in critical areas.
Solution Approach 2:
The stitching shapes act as intermediary elements that connect different layout regions and prevent acute corners. These intermediary shapes mediate between the decomposed layout segments, ensuring manufacturing precision without requiring fundamental changes to the overall layout structure.
3Manufacturing precision
If design layout is converted to curved polygon type, then manufacturing precision is improved, but ease of manufacture worsens
Solution Approach 1:
The patent converts polygon-type design layouts to curved polygon types to improve manufacturing precision and eliminate acute corners. This curvature transformation ensures smoother pattern edges that are more suitable for photolithography processes, directly improving pattern accuracy while the automated conversion process manages the manufacturing complexity.
Data Source
AI summary
A method of decomposing a design layout for a double patterning process is provided. The method includes changing, by a computing system, a design layout of a first polygon type to a design layout of a curved polygon type; coloring the design layout of the curved polygon type; generating stitching shapes for preventing acute corners in stitching areas of the colored design layout of the curved polygon type; separating the design layout including the stitching shapes for preventing the acute corners into separated design layouts of curved polygon type according to colors; and changing the separated design layouts of the curved polygon type to design layouts of a second polygon type.