Curved Post Scan Electrode for Ion Implanter Beam Refraction

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Conventional ion implanters with flat post scan electrodes cause an undesirable shift of the apparent scan origin due to beam refraction, leading to compromised dosimetry accuracy and process parameters.

Innovation Solution

An ion implanter system with a post scan electrode having a curved or arced shape that maintains the apparent scan origin at the same position as the actual scan origin, preventing refractive shifts and allowing for higher voltage usage without compromising beam parallelism.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Device complexity

If a flat post scan electrode is used, then the device structure is simple, but the apparent scan origin shifts downstream due to beam refraction

Engineering Contradiction:
Improveelectrode structureVSAvoidscan origin position
Core Design Contradiction:
Device complexityVSMeasurement precision

Solution Approach 1:

The post scan electrode surface is changed from flat to curved (cylindrical or spherical curvature). This curvature compensates for the beam refraction effect, causing the refracted beam paths to converge at the correct scan origin position rather than shifting downstream. The curved surface normal at each point is oriented to redirect beams appropriately.

Inventive Principle:
Principle #14Spheroidality (Curvature)

2Ease of manufacture

If a flat post scan electrode is used, then manufacturing is easier, but dosimetry accuracy is compromised

Engineering Contradiction:
Improveelectrode fabricationVSAvoiddosimetry accuracy
Core Design Contradiction:
Ease of manufactureVSManufacturing precision

Solution Approach 1:

The curved surface geometry of the post scan electrode corrects the beam refraction-induced shift in apparent scan origin, thereby restoring accurate dosimetry measurements. The curvature is specifically designed to counteract the refraction effects and maintain the correct beam geometry for accurate dose delivery.

Inventive Principle:
Principle #14Spheroidality (Curvature)

3Productivity

If higher voltage is applied to scan plates, then beam scanning performance improves, but the apparent scan origin shift increases

Engineering Contradiction:
Improvebeam scanning performanceVSAvoidscan origin position
Core Design Contradiction:
ProductivityVSMeasurement precision

Solution Approach 1:

The curved post scan electrode surface is designed to compensate for the increased beam refraction effects that occur at higher scan plate voltages. By adjusting the curvature parameters, the electrode can correct for larger angular deviations while maintaining the scan origin at the correct position, thus enabling higher voltage operation without origin shift.

Inventive Principle:
Principle #14Spheroidality (Curvature)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The curved post scan electrode maintains accurate beam alignment and dosimetry, enabling the use of higher voltages and reducing the need for a higher collimator field, thus improving process parameters and dosimetry accuracy.

Implementation Method 1

The undesirable downstream shift of the apparent scan origin compared to the actual scan origin is caused by beam refraction associated with the flat post scan electrode.

Methodology Applied
Scientific EffectBeam refraction: Refraction

Data Source

PatentUS9905396B1Curved post scan electrode
Publication Date: 2018.02.27 VARIAN SEMICON EQUIP ASSC INC
  • US9905396B1 patent drawing
  • US9905396B1 patent drawing
  • US9905396B1 patent drawing

AI summary

An apparatus an ion beam generator to provide an ion beam. A scanning system may receive the ion beam and provide a scanned beam. An electrode may receive the scanned beam. At least a portion of the electrode is normal to a propagation direction of the scanned beam. The portion of the electrode that is normal to the propagation direction the scan beam may have a curved shape.