Curved Substrate Cleaning System with Height-Adjustable Clamp
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Solution Overview
Problem
Conventional cover glass cleaning processes struggle with increasing curvature and size variations, making traditional flat pressure cleaning difficult or impossible.
Innovation Solution
A multi-curvature target substrate cleaning system and method that uses a height-variable clamp to maintain the cleaning area at an optimal orientation, allowing for pressure cleaning without damaging the cover glass.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If traditional flat pressure cleaning is used, then cleaning effectiveness is maintained, but it becomes difficult or impossible to clean curved substrates with increasing curvature and size
Solution Approach 1:
The clamp means is designed with height-adjustable functionality that dynamically adapts to different substrate curvatures. The clamp can move vertically to position the cleaning area at different heights relative to the cleaning unit, allowing the system to accommodate various curvature radii while maintaining effective pressure cleaning operation.
2Productivity
If pressure is applied to clean curved substrates, then cleaning effectiveness improves, but damage such as scratches may occur
Solution Approach 1:
A support body is introduced as an intermediary element between the cleaning unit and the curved substrate. The support body provides a intermediate surface that distributes the cleaning pressure uniformly across the cleaning area, preventing localized stress concentration that would cause scratches while maintaining sufficient cleaning effectiveness.
3Manufacturing precision
If the cleaning area is maintained at optimal orientation, then cleaning quality maximizes, but device complexity increases due to height-adjustable clamp and support body
Solution Approach 1:
The support system is segmented into distinct functional components: a clamp means for gripping the substrate, a support body for providing structural support and height adjustment, and a cleaning unit for performing the cleaning operation. This segmentation allows each component to be optimized independently while working together to achieve precise cleaning area orientation.
Data Source
AI summary
A curved target substrate cleaning system includes a pressure-type cleaning unit for cleaning a cleaning area of a target substrate having a curved surface by applying pressure to the cleaning area, a support body detachably supporting the pressure cleaning unit at a predetermined height with respect to a cleaning area of the target substrate having the curved portion, a cleaning area flat maintaining unit that clamps one end of a target substrate having a curved portion and adjusts a height of the curved portion to maintain the cleaning area of the target substrate in a predetermined orientation with respect to the pressure-type cleaning unit, and a moving unit that moves the cleaning area flat maintenance unit back and forth in one direction with respect to the pressure-type cleaning unit.