Curved Substrate Holder Layout for Uniform Deposition Coating

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Solution Overview

Problem

Existing deposition technologies struggle to uniformly coat materials on substrates with curved surfaces, leading to uneven film thickness and color differences, and are limited in handling substrates with varying curvatures and slopes.

Innovation Solution

A deposition apparatus and method featuring a substrate holder with a base portion, a first supporting portion with a curved surface, and a second supporting portion with an inclined surface, along with adjustable adjustment plates, allowing for precise alignment and rotation of substrates to ensure uniform coating across both flat and curved sections.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If conventional deposition technology is used on curved surfaces, then deposition can be performed, but film thickness becomes uneven and color differences occur

Engineering Contradiction:
Improvefilm thickness uniformityVSAvoidhandling curved surfaces
Core Design Contradiction:
Manufacturing precisionVSEase of operation

Solution Approach 1:

The substrate holder is segmented into multiple supporting portions with different curvature radii, allowing the substrate to be divided into different regions (flat, curved, etc.) that can be independently supported. This segmentation enables precise positioning of the substrate on the holder, ensuring uniform film thickness during deposition by matching each substrate region with the appropriate supporting portion curvature.

Inventive Principle:
Principle #1Segmentation

2Adaptability or versatility

If a fixed substrate holder is used, then the structure is simple, but it cannot handle substrates with varying curvatures and slopes

Engineering Contradiction:
Improvehandling various curvaturesVSAvoidsubstrate holder structure
Core Design Contradiction:
Adaptability or versatilityVSDevice complexity

Solution Approach 1:

The substrate holder is designed with multiple supporting portions that can be interchangeably installed on the same holder body. Each supporting portion has a different curvature radius, allowing the holder to universally accommodate various substrate types (flat, curved, different radii) using the same base structure. This multi-functionality achieves adaptability without significantly increasing overall device complexity.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Solution Approach 2:

The substrate holder employs interchangeable supporting portions that can be dynamically adjusted and replaced based on the specific substrate requirements. This dynamic configuration allows the system to adapt to different curvature and slope requirements by selecting the appropriate supporting portion, making the holder structure flexible rather than fixed.

Inventive Principle:
Principle #15Dynamics

3Manufacturing precision

If substrates are not properly aligned, then the deposition process is simple, but color differences and uneven coating occur

Engineering Contradiction:
Improvecoating uniformityVSAvoidalignment mechanism
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The substrate holder is designed with pre-formed supporting portions that have specific curvature radii and geometric configurations. Before deposition, the appropriate supporting portion is pre-installed on the holder based on the substrate type, and the substrate is pre-positioned on this customized support. This preliminary preparation ensures proper alignment and contact between the substrate and holder, preventing color differences and uneven coating during the deposition process.

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Ensures uniform film thickness and reduced color differences on substrates with curved surfaces, facilitating efficient deposition on substrates with diverse geometries and reducing material waste by allowing interchangeable supporting portions for different curvatures and slopes.

Implementation Method 1

depositing the material of the first target on the at least one substrate; depositing the material of the second target on the material of the first target that is on the at least one substrate

Methodology Applied
Scientific EffectPhysical vapor deposition: Physical Vapour Deposition

Data Source

PatentUS12509761B2Deposition apparatus and deposition method
Publication Date: 2025.12.30 INNOLUX CORP
  • US12509761B2 patent drawing
  • US12509761B2 patent drawing
  • US12509761B2 patent drawing

AI summary

A deposition apparatus is provided, including a deposition chamber, at least one target, at least one substrate holder, and at least one adjustment plate. The at least one target, the at least one substrate holder, and the at least one adjustment plate are disposed in the deposition chamber, and the at least one adjustment plate is disposed between the at least one target and the at least one substrate holder. The at least one substrate holder includes a base portion, a first supporting portion, and a second supporting portion. The base portion has a flat surface. The first supporting portion is disposed on the flat surface and includes a curved surface. The second supporting portion is disposed on the flat surface and protrudes from it.