Curved Substrate Sputtering with Dynamic Target Positioning
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
The uneven thickness of coatings on curved substrates due to inconsistent distance between the substrate and the sputtering target leads to chromatic aberration and quality issues in curved display devices.
Innovation Solution
A coating device with a position-adjusting mechanism that adjusts the sputtering mechanism to maintain a consistent distance with the curved substrate's varying surface, ensuring uniform coating thickness across different areas.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a fixed-position sputtering mechanism is used for curved substrates, then the device structure is simple, but the coating thickness becomes uneven due to inconsistent distance from different parts of the curved substrate to the target
Solution Approach 1:
The sputtering mechanism is transformed from a fixed position to a movable position through the position-adjusting mechanism, allowing dynamic adjustment of the distance between the sputtering target and different parts of the curved substrate. This enables the coating thickness to be controlled uniformly across the curved surface by compensating for the varying distances.
Solution Approach 2:
The coating process is divided into multiple stages, with the sputtering mechanism adjusting to different positions for different regions of the curved substrate. The position-adjusting mechanism enables segmented coating operations, where each region receives optimized sputtering parameters to achieve uniform overall coating thickness.
2Productivity
If the sputtering target is positioned close to the curved substrate to improve coating efficiency, then productivity increases, but the distance inconsistency causes greater coating thickness variation
Solution Approach 1:
The position-adjusting mechanism allows the sputtering target to dynamically adjust its distance from the curved substrate surface during the coating process. This enables maintaining optimal coating efficiency while compensating for distance variations to ensure uniform coating thickness across different regions.
Solution Approach 2:
The sputtering mechanism applies different local conditions to different regions of the curved substrate by adjusting its position. Each region receives tailored sputtering parameters based on its specific distance from the target, ensuring uniform coating quality while maintaining overall high productivity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution achieves even coating thickness and improved quality by dynamically adjusting the sputtering mechanism's position relative to the curved substrate, enhancing the appearance and functionality of curved display devices.
Implementation Method 1
sputtering a coating material to different parts of the second surface of the curved substrate by the sputtering mechanism at the different positions
Data Source
AI summary
A method for coating a curved substrate is disclosed, which includes: providing a coating device including: a chamber, a carrying platform, a sputtering mechanism, and a position-adjusting mechanism, wherein the carrying platform is disposed in the chamber and has a first surface, the sputtering mechanism is disposed in the chamber and is disposed corresponding to the carrying platform, and the position-adjusting mechanism is disposed in the chamber; providing a curved substrate, wherein the curved substrate is disposed on the first surface of the carrying platform and the curved substrate has a second surface; adjusting the sputtering mechanism to different positions by the position-adjusting mechanism; and sputtering a coating material to different parts of the second surface of the curved substrate by the sputtering mechanism at the different positions.