Curvilinear Design Rule Checking for Photonic Circuits
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional design-rule checking algorithms are inadequate for curvilinear features in photonic circuits, leading to stepped surfaces during fabrication that introduce losses and interference in optoelectronic devices, as they typically check dimensions and spacing for rectangular, or 'Manhattanized,' features rather than free-form curvilinear shapes.
Innovation Solution
A method involving a processor-based system that defines vertices for curvilinear features, determines the radius of curvature between vertices, and identifies design rule violations, allowing for iterative adjustments to the device layout to prevent curvature violations, thereby maintaining the free-form nature of photonic designs throughout the manufacturing process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional design-rule checking algorithms are used for curvilinear features, then the checking process can be completed, but the features are incorrectly treated as rectangular leading to stepped surfaces in fabrication
Solution Approach 1:
The patent changes the parameter representation from rectangular coordinates to polar coordinates (radius and angle) to accurately represent curvilinear features. By calculating radius of curvature at each vertex and storing it alongside vertex coordinates, the system transforms how curvilinear data is structured, enabling precise representation that maintains manufacturing accuracy while being compatible with design-rule checking processes.
2Manufacturing precision
If curvilinear representations are maintained through data processing steps, then the final mask shapes closely match design intent, but conventional design-rule checking algorithms cannot properly verify the features
Solution Approach 1:
The patent introduces an intermediary representation layer that converts curvilinear features into a format suitable for design-rule checking. By calculating derived parameters such as radius of curvature, chord lengths, and vertex angles, the system creates an intermediate data structure that preserves the original curvilinear geometry while providing measurable parameters that can be verified against design rules.
Solution Approach 2:
The patent segments the curvilinear feature into discrete vertices, each with associated radius of curvature and angular information. This segmentation allows the continuous curvilinear shape to be analyzed in discrete, measurable units that can be individually checked against design rules while collectively maintaining the overall curved geometry.
3Ease of manufacture
If curved interfaces are implemented as small rectangular steps, then design-rule checking can be performed, but loss and interference are introduced in fabricated optoelectronic devices
Solution Approach 1:
The patent directly applies curvature by representing features using polar coordinates with radius of curvature parameters at each vertex. This eliminates the need to approximate curved interfaces with rectangular steps, maintaining true curvilinear geometry throughout the design and fabrication process, thereby preventing the energy loss and interference that would result from stepped approximations.
Data Source
AI summary
One illustrative system includes a processor and memory storing instructions that, when executed by the processor, cause the system to receive a device layout including a curvilinear feature, define a plurality of vertices for the curvilinear feature, determine a radius of curvature between a selected vertex in the plurality of vertices and a neighboring vertex in the plurality of vertices, and identify a design rule violation for the curvilinear feature responsive to the radius of curvature being less than a predetermined threshold.