Curvilinear IC Interconnect Layout for RC-Aware Routing
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Solution Overview
Problem
Conventional routing algorithms for integrated circuits are limited by rectilinear conventions, leading to inefficiencies and constraints in integrated circuit operation, particularly at nanometer process nodes, where manufacturability and performance are compromised due to edge-placement errors and lack of consideration for physically meaningful RC values.
Innovation Solution
An iterative cell-based optimizer employing first principles techniques and machine learning models to modify interconnect shapes in integrated circuit layouts, using three-dimensional representations and electromagnetic simulations to optimize RC time constants and manufacturability, allowing for curvilinear layouts that depart from rectilinear constraints.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If rectilinear routing conventions are used, then routing simplicity and ease of manufacture are improved, but RC time constant performance and circuit speed are worsened
Solution Approach 1:
The patent applies curvilinear routing instead of rectilinear conventions, allowing wire paths to follow curved trajectories that optimize RC time constants. The shape optimizer modifies wire geometry to achieve better electrical performance while remaining manufacturable at nanometer process nodes.
Solution Approach 2:
The patent changes the geometric parameters of interconnect shapes from fixed rectilinear forms to variable curvilinear forms. The shape optimizer adjusts wire width, curvature, and path geometry to minimize RC time constants, transforming the routing from rigid grid-based paths to flexible continuous curves.
2Device complexity
If conventional grid-based routing is used, then routing algorithm simplicity is improved, but routing efficiency and geometry optimization are worsened
Solution Approach 1:
The patent replaces traditional mechanical grid-based routing algorithms with a physics-based optimization approach. Instead of moving wires along discrete grid steps, the system uses electromagnetic field simulations and RC time constant calculations to guide wire placement, substituting physical field theory for mechanical routing rules.
Solution Approach 2:
The shape optimizer performs self-service optimization by automatically adjusting wire geometries based on RC time constant calculations. The system iteratively refines interconnect shapes without requiring manual intervention, using first-principles physics to guide the optimization process.
3Reliability
If detailed routing is performed after global routing, then routing completeness is improved, but overall routing time and computational resources are worsened
Solution Approach 1:
The patent performs preliminary shape optimization during the global routing stage rather than waiting for detailed routing. By calculating and optimizing RC time constants early in the design process, the system establishes optimized wire paths that guide subsequent detailed routing, reducing the need for iterative adjustments later.
Solution Approach 2:
The patent merges global routing and detailed routing objectives by integrating RC time constant optimization into the early routing stages. Instead of treating global and detailed routing as separate sequential processes, the system combines geometric optimization considerations throughout the routing workflow, reducing total computational time.
Data Source
AI summary
Systems, devices, and methods for optimization of conducting interconnects are described. A method includes receiving an integrated circuit layout including a plurality of terminals and an interconnect, wherein the interconnect represents a conductive coupling between the plurality of terminals. The method includes receiving terminal information describing operating parameters of the plurality of terminals. The method includes receiving layer information describing material composition and material property information for the plurality of terminals and the interconnect. The method includes generating a three-dimensional representation of an integrated circuit using the integrated circuit layout and the layer information. The method includes determining an individual contribution of a cell included in the three-dimensional representation to a resistance-capacitance (RC) value of the interconnect using the three-dimensional representation and the terminal information. The method also includes generating an updated integrated circuit layout based at least in part on the individual contribution.


