Curvilinear Mask Synthesis via Ray-Based Offset Adjustment
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Solution Overview
Problem
The increasing complexity of mask shapes in integrated circuit design poses challenges for geometric processing algorithms, particularly in synthesizing curvilinear masks, as existing methods are computationally intensive and suffer from inconsistencies and loss of connectivity between mask and design edges.
Innovation Solution
A method involving the generation of rays from anchor points on the boundary of target and mask shapes, with distances between intersections modified based on errors between the target and resulting shapes, allowing for curvilinear mask synthesis that maintains lithographic quality and connectivity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If curvilinear mask shapes are used to increase mask complexity and design flexibility, then the range of possible mask shapes is improved, but the computational complexity of geometric processing algorithms increases
Solution Approach 1:
The patent segments the curvilinear mask boundary into multiple discrete anchor points. By representing complex curvilinear shapes as sequences of connected anchor points rather than continuous curves, the algorithm reduces computational complexity while maintaining design flexibility. Each anchor point can be independently adjusted, enabling curvilinear mask synthesis without requiring complex geometric processing of entire curves.
Solution Approach 2:
The patent replaces traditional geometric processing algorithms with a ray-based approach. Instead of using complex mechanical geometric operations to handle curvilinear shapes, the system uses rays emanating from anchor points to define mask boundaries. This substitution simplifies the computational model while preserving the ability to create complex curvilinear mask shapes.
2Manufacturing precision
If traditional geometric processing algorithms are used for mask optimization, then mask synthesis is achieved, but inconsistencies and loss of connectivity between mask and design edges occur
Solution Approach 1:
The patent implements a feedback mechanism where rays are used to continuously monitor and maintain connectivity between mask edges and design edges during optimization. The ray-based approach provides real-time information about edge relationships, allowing the algorithm to detect and correct connectivity issues before they propagate through the optimization process, ensuring consistent connectivity throughout mask synthesis.
Solution Approach 2:
The patent introduces rays as intermediary elements between the mask boundary and design target. These rays serve as mediators that maintain the relationship between mask edges and design edges throughout the optimization process. By using rays as intermediaries, the system ensures that connectivity is preserved while allowing the mask shape to evolve toward the target design.
Data Source
AI summary
Aspects described herein relate to mask synthesis using design guided offsets. A target shape on an image surface to be fabricated using a mask based on a design of an integrated circuit is obtained. Rays are generated emanating from respective anchor points. The anchor points are on a boundary of the target shape or a boundary of a mask shape of the mask. For each ray of the rays, a distance is defined between a first intersection of the respective ray and the boundary of the target shape and a second intersection of the respective ray and the boundary of the mask shape. An analysis is performed by one or more processors, where the analysis is configured to modify the distances based on an error between the target shape and a resulting shape simulated to be on the image surface resulting from the mask shape.