CVD Chamber Component Support for Protected Backside Fixture Points
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Challenging to effectively coat chamber components during CVD processes, leading to weak spots and reduced service life, particularly at fixture points where reactant gases interact, causing damage.
Innovation Solution
A component support system with contact rods that contact chamber components at predefined fixture points on their backside, minimizing reactant gas exposure and ensuring uniform coating at these critical areas.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Duration of action of stationary object
If chamber components are coated during CVD process, then the component service life is improved, but weak spots are created at fixture points where reactant gases interact
Solution Approach 1:
The patent applies preliminary action by pre-defining fixture points on the chamber component before the CVD coating process. These fixture points are strategically located to minimize reactant gas interaction during coating, thereby preventing weak spots from forming in the first place rather than attempting to repair them afterward.
Solution Approach 2:
The patent implements local quality by creating different surface characteristics at different locations of the chamber component. The fixture points are specifically designed with enhanced coating properties or protective features that differ from the rest of the component surface, providing localized protection against reactant gas damage at these critical contact areas.
2Manufacturing precision
If contact rods are used to hold chamber component, then positioning precision is improved, but reactant gas exposure at contact points increases causing damage
Solution Approach 1:
The patent uses an intermediary approach by introducing a protective coating or barrier layer at the contact points between the chamber component and support structure. This intermediary layer allows the component to be securely held in precise position while simultaneously protecting the contact areas from harmful reactant gas interaction during the CVD process.
3Manufacturing precision
If chamber component is coated with carbon-containing material, then coating uniformity is improved, but coating at fixture points becomes challenging
Solution Approach 1:
The patent applies segmentation by dividing the chamber component surface into distinct zones: fixture points and non-fixture areas. This segmentation allows for differentiated treatment where fixture points receive specialized protection or modified coating parameters, while the rest of the surface receives standard uniform coating, thereby resolving the conflict between overall uniformity and localized coating challenges.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enhances the durability and service life of chamber components by reducing stress and wear at fixture points, thereby improving their performance in semiconductor processing.
Implementation Method 1
coating the chamber component with a carbon-containing material while the chamber component is supported on the component support
Data Source
AI summary
Embodiments disclosed herein include to a component support for use in coating chamber components via chemical vapor deposition (CVD). The component support includes contact rods configured to contact chamber components at fixture points located on the backside of the chamber components. The component supports are configured to support the chamber components in the processing volume with minimal contact of the chamber components. The fixture points on the backside reduce exposure of the fixture points to reactant gases when the chamber components are installed.