CVD Precursor Container with Vacuum Insulation for Stable Vaporization
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Solution Overview
Problem
Existing CVD precursor containers face challenges in maintaining precursor purity during storage, transportation, and vaporization, with issues such as contamination, corrosion, and unstable temperature control, particularly when using organometallic compounds.
Innovation Solution
A CVD precursor supply container with a double-wall structure, vacuum heat insulation, and a metal interior coated with diamond-like carbon (DLC) layers to maintain temperature stability and prevent contamination, combined with a reusable design for efficient cleaning and refilling.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a fluororesin coating is applied to the container interior surface to prevent contamination, then precursor purity is improved, but stable vaporization and supply of precursor cannot be ensured
Solution Approach 1:
The container employs a composite structure combining metal material (for thermal conductivity and structural strength) with a fluororesin coating layer (for contamination prevention). This composite approach allows simultaneous achievement of stable vaporization through metal thermal properties and precursor purity through the fluororesin coating's chemical inertness and non-stick characteristics.
2Temperature
If the container is heated from the outside to vaporize the precursor, then vaporization is achieved, but temperature control becomes troublesome due to heat loss
Solution Approach 1:
The container is equipped with a lid that creates a sealed environment, and inert gas may be introduced to prevent oxidation and contamination. This inert atmosphere maintains stable thermal conditions during heating and vaporization processes, reducing unwanted heat loss and improving temperature control.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Ensures stable vaporization and supply of high-purity precursors to CVD apparatuses, allowing for the production of high-quality semiconductor products by minimizing contamination and corrosion, and enabling repeated use of the container.
Implementation Method 1
a vacuum heat insulating layer provided between the inner tube and the outer tube
Implementation Method 2
the metal container has a bottom to be heated by a heat source
Implementation Method 3
A precursor contained in such a bubbling container is heated to be vaporized by blowing inert gas into the container
Data Source
AI summary
A CVD container having excellent temperature controllability which ensures that a CVD precursor can be stably vaporized and supplied to a CVD apparatus is described. The CVD precursor supply container is adapted to vaporize a CVD precursor and supply the vaporized CVD precursor, and includes a metal container having a side portion of a double-wall structure including an inner tube and an outer tube each made of a metal, and a vacuum heat insulating layer provided between the inner tube and the outer tube.


