Hollow-Rod CVD Susceptor for Uniform Induction Heating
Solution Overview
Problem
Conventional cylinder-shaped solid susceptors in chemical vapor deposition systems with induction heating suffer from non-uniform temperature distribution across their surfaces, leading to undesirable variations in physical and chemical properties of deposited materials, particularly at critical growth temperatures.
Innovation Solution
A susceptor design featuring a horizontal component with a top surface for wafer support and a vertical component with a hollow region, optimized in terms of radius and depth to promote uniform temperature distribution, combined with adjustable dimensions and features like fillets and grooves to enhance heat transfer and control.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If a conventional solid cylinder-shaped susceptor with a hole in the bottom is used, then the structure is simple and easy to manufacture, but the temperature distribution across the susceptor surface becomes non-uniform
Solution Approach 1:
The susceptor is divided into multiple functional regions: a horizontal plate for wafer support, a vertical rod for induction heating coupling, and a hollow cylindrical region within the rod. This segmentation allows each region to serve its specific function optimally, with the hollow region preventing excessive heat concentration at the center while the vertical rod provides efficient induction heating.
Solution Approach 2:
The hollow region is strategically positioned within the vertical rod to create local thermal management. The hollow space prevents direct heat conduction path from the induction coil to the horizontal plate center, allowing differential heat distribution - the edges receive heat from the plate while the center benefits from reduced heat conduction through the hollow region, achieving uniform temperature distribution.
2Temperature
If the susceptor uses a hollow region design, then temperature uniformity is improved, but the structural complexity increases
Solution Approach 1:
The hollow cylindrical region is nested within the vertical rod, creating a concentric structure where the hollow space is contained within the solid rod material. This nested design achieves complex thermal management functionality while maintaining a relatively simple overall structure that can be manufactured using conventional techniques.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The design achieves a significantly more uniform temperature distribution across the susceptor surface, reducing temperature differences to less than 5°C, which is critical for fabricating high-quality thin films, especially at high growth temperatures.
Implementation Method 1
chemical vapor deposition systems with induction heating
Implementation Method 2
induction heating
Implementation Method 3
a hollow region within the vertical component... for promoting temperature uniformity
Data Source
AI summary
Embodiments of the present disclosure describe a susceptor for chemical vapor deposition comprising a horizontal component with a top surface and a bottom surface, wherein the top surface is configured to support one or more wafers; a vertical component extending from the bottom surface of the horizontal component along a longitudinal axis that is substantially perpendicular to the horizontal component; and a hollow region within the vertical component. Embodiments of the present disclosure describe a susceptor for chemical vapor deposition comprising a horizontal plate with a top surface configured to support one or more wafers, a vertical rod integrated with and perpendicular to the horizontal plate, and a hollow region within the vertical rod for promoting temperature uniformity across the top surface of the horizontal plate.